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公开(公告)号：US20190324365A1
公开(公告)日：2019-10-24
申请号：US16502674
申请日：2019-07-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan DE GROOT , Gerard Frans Jozef SCHASFOORT , Maksym Yuriiovych SLADKOV , Manfred Petrus Johannes M DIKKERS , Jozef Maria FINDERS , Pieter-Jan VAN ZWOL , Johannes Jacobus Matheus BASELMANS , Stefan Michael Bruno BAUMER , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF , Robbert Jan VOOGD
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：US20210349398A1
公开(公告)日：2021-11-11
申请号：US17282871
申请日：2019-09-19
Applicant: ASML NETHERLANDS B.V.
Inventor： Vahid MOHAMMADI , Yassin CHOWDHURY , Pieter Cristiaan DE GROOT , Wouter Joep ENGELEN , Marcel Johannes Petrus Theodorus VAN DER HOORN
IPC: G03F7/20 , H01L31/02 , H01L31/0216 , H01L31/18
Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.
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公开(公告)号：US20190137861A1
公开(公告)日：2019-05-09
申请号：US16300370
申请日：2017-05-30
Applicant: ASML Netherlands B.V.
Inventor： Pieter Cristiaan DE GROOT , Gerard Frans Jozef SCHASFOORT , Maksym Yuriiovych SLADKOV , Manfred Petrus Johannes Maria DIKKERS , Jozef Maria FINDERS , Pieter-Jan VAN ZWOL , Johannes Jacobus Matheus BASELMANS , Stefan Michael Bruno BAUMER , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF , Robbert Jan VOOGD
CPC classification number: G03F1/24 , G02B5/0278 , G02B5/0284 , G02B5/22 , G02B2005/1804 , G03F1/42 , G03F1/44 , G03F7/706 , G03F7/70683 , G03F9/7076
Abstract: A patterning device comprising a reflective marker, wherein the marker comprises: a plurality of reflective regions configured to preferentially reflect radiation having a given wavelength; and a plurality of absorbing regions configured to preferentially absorb radiation having the given wavelength; wherein the absorbing and reflective regions are arranged to form a patterned radiation beam reflected from the marker when illuminated with radiation, and wherein the reflective regions comprise a roughened reflective surface, the roughened reflective surface being configured to diffuse radiation reflected from the reflective regions, and wherein the roughened reflective surface has a root mean squared roughness of about an eighth of the given wavelength or more.
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公开(公告)号：US20180081278A1
公开(公告)日：2018-03-22
申请号：US15789702
申请日：2017-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Olav Waldemar Vladimir FRIJNS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Rilpho Ludovicus DONKER , Han-Kwang NIENHUYS , Borgert KRUIZINGA , Wouter Joep ENGELEN , Otger Jan LUITEN , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Vladimir LITVINENKO
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：US20170237225A1
公开(公告)日：2017-08-17
申请号：US15502462
申请日：2015-07-27
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Teis Johan COENEN , Jeroen Johannes Michiel VAN HELVOORT , Wouter Joep ENGELEN , Gerrit Jacobus Hendrik BRUSSAARD , Gijsbertus Geert POORTER , Erik Roelof LOOPSTRA
CPC classification number: H01S3/0903 , H01S3/0071 , H01S3/0959 , H01S3/1024 , H01S3/11 , H01S3/1103
Abstract: Passage through LINACs of electron bunches in their acceleration phase is coordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps: for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is coordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.
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Patent Agency Ranking
公开(公告)号：US20240385356A1
公开(公告)日：2024-11-21
申请号：US18559942
申请日：2022-04-28
Applicant: ASML NETHERLANDS B.V
Inventor： Derick Yun Chek CHONG , Pieter Cristiaan DE GROOT , Wouter Joep ENGELEN , Bogathi Vishnu, Vardhana REDDY
Abstract: Diffraction gratings for a phase-stepping measurement system for determining an aberration map for a projection system are disclosed. The gratings are two-dimensional diffraction gratings for use as wafer level gratings in an EUV lithographic apparatus. In particular, the diffraction gratings include a substrate provided with a two-dimensional array of circular through-apertures and are self-supporting. In some embodiments, a ratio of the radius of the circular apertures to the distance between the centers of adjacent apertures may be selected to minimize the gain and cross-talk errors of a wavefront reconstruction algorithm. For example, the ratio may be between 0.34 and 0.38. In some embodiments, the circular apertures are distributed such that a distance between the centers of adjacent apertures is non-uniform and varies across the diffraction grating. For example, a local pitch of the grating may vary randomly across the diffraction grating.
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公开(公告)号：US20240361698A1
公开(公告)日：2024-10-31
申请号：US18565200
申请日：2022-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Albertus HARTGERS , Marco Matheus Louis STEEGHS , Gerardus Hubertus Petrus Maria SWINKELS , Giovanni IMPONENTE , Nicholas William Maria PLANTZ , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF
IPC: G03F7/20
CPC classification number: G03F7/2002
Abstract: A plate for use in an imaging system to determine at least two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate including a plurality of markers, wherein a first subset of the plurality of markers includes a first type of markers for determining a first optical property of the illumination beam, and a second subset of the plurality of markers includes a second type of markers for determining a second optical property of the illumination beam, wherein the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.
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公开(公告)号：US20190035594A1
公开(公告)日：2019-01-31
申请号：US16072385
申请日：2017-02-07
Applicant: ASML Netherlands B.V.
IPC: H01J37/073 , H01S3/09
CPC classification number: H01J37/073 , H01J2237/063 , H01S3/0903 , H05H2007/084
Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: a cathode (203) configured to be connected to a negative potential (100, 101); a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.
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公开(公告)号：US20160301180A1
公开(公告)日：2016-10-13
申请号：US15035674
申请日：2014-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Johannes Antonius Gerardus AKKERMANS , Erik LOOPSTRA , Wouter Joep ENGELEN , Petrus Rutgerus BARTRAIJ , Teis Johan COENEN , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
Abstract translation: 一种用于提供电子束的喷射装置。 喷射器装置包括用于提供电子束的第一喷射器和用于提供电子束的第二喷射器。 喷射器装置可以在第一模式中操作，其中电子束包括仅由第一注射器提供的电子束和第二模式，其中电子束包括仅由第二注射器提供的电子束。
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公开(公告)号：US20230251407A1
公开(公告)日：2023-08-10
申请号：US18003301
申请日：2021-06-17
Applicant: ASML Netherlands B.V.
Inventor： Derick Yun Chek Chong , Wouter Joep ENGELEN , Vyacheslav KACHKANOV , Vahid MOHAMMADI , Pieter Cristiaan DE GROOT
CPC classification number: G02B5/1866 , G02B5/1857 , G03F7/70158 , G03F7/706 , G03F7/7085 , G02B2207/107
Abstract: A transmissive diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises an absorbing layer. The diffraction grating is for use with radiation having a first wavelength (for example (EUV radiation). The absorbing layer is provided with a two-dimensional array of through-apertures. The absorbing layer is formed from a material which has a refractive index for the radiation having the first wavelength in the range 0.% to 1.04.
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