公开(公告)号：US10901330B2

公开(公告)日：2021-01-26

申请号：US16417706

申请日：2019-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US12013647B2

公开(公告)日：2024-06-18

申请号：US17419648

申请日：2019-12-24

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Marc Johannes Noot ,  Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Grzegorz Grzela ,  Timothy Dugan Davis ,  Olger Victor Zwier ,  Ralph Timotheus Huijgen ,  Peter David Engblom ,  Jan-Willem Gemmink

IPC: G03F7/00 ,  G01N21/47 ,  G06T7/00

CPC classification number: G03F7/70633 ,  G01N21/47 ,  G06T7/0004 ,  G01N2021/4735 ,  G06T2207/30148

Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.

公开(公告)号：US11703772B2

公开(公告)日：2023-07-18

申请号：US17124758

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/00 ,  G01B11/27

CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US10001711B2

公开(公告)日：2018-06-19

申请号：US15104212

申请日：2014-11-20

Applicant: ASML Netherlands B.V.

Inventor： Youri Johannes Laurentius Maria Van Dommelen ,  Peter David Engblom ,  Lambertus Gerardus Maria Kessels ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya ,  Paul Christiaan Hinnen ,  Marco Johannes Annemarie Pieters

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70683

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

公开(公告)号：US11860548B2

公开(公告)日：2024-01-02

申请号：US17425355

申请日：2020-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Hermanus Adrianus Dillen ,  Marc Jurian Kea ,  Mark John Maslow ,  Koen Thuijs ,  Peter David Engblom ,  Ralph Timotheus Huijgen ,  Daan Maurits Slotboom ,  Johannes Catharinus Hubertus Mulkens

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/7065 ,  G03F7/70525 ,  G03F7/70658

Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.

公开(公告)号：US20190271921A1

公开(公告)日：2019-09-05

申请号：US16417706

申请日：2019-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US10394137B2

公开(公告)日：2019-08-27

申请号：US15968743

申请日：2018-05-01

Applicant: ASML Netherlands B.V.

Inventor： Youri Johannes Laurentius Maria Van Dommelen ,  Peter David Engblom ,  Lambertus Gerardus Maria Kessels ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya ,  Paul Christiaan Hinnen ,  Marco Johannes Annemarie Pieters

IPC: G03F7/20

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

公开(公告)号：US10338484B2

公开(公告)日：2019-07-02

申请号：US15181126

申请日：2016-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G01B11/14 ,  G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US20180253018A1

公开(公告)日：2018-09-06

申请号：US15968743

申请日：2018-05-01

Applicant: ASML Netherlands B.V.

Inventor： Youri Johannes Laurentius Maria VAN DOMMELEN ,  Peter David Engblom ,  Lambertus Gerardus Maria Kessels ,  Arie Jeffrey Den Boef ,  Kaustuve Bhattacharyya ,  Paul Christiaan Hinnen ,  Marco Johannes Annemarie Pieters

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70683

Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.