公开(公告)号：US10248027B2

公开(公告)日：2019-04-02

申请号：US15525610

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Raoul Maarten Simon Knops ,  Bob Streefkerk ,  Christiaan Louis Valentin ,  Jan Bernard Plechelmus Van Schoot ,  Wilhelmus Franciscus Johannes Simons ,  Leon Leonardus Franciscus Merkx ,  Robertus Johannes Marinus De Jongh ,  Roel Johannes Elisabeth Merry ,  Michael Frederik Ypma

IPC: G03F7/20

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

公开(公告)号：US09857698B2

公开(公告)日：2018-01-02

申请号：US15303478

申请日：2015-03-19

Applicant: ASML Netherlands B.V.

Inventor： Robertus Johannes Marinus De Jongh ,  Leon Leonardus Franciscus Merkx ,  Roel Johannes Elisabeth Merry

IPC: G02B27/54 ,  G03F7/20 ,  G02B7/182

CPC classification number: G03F7/70775 ,  G02B7/1828 ,  G03F7/70258 ,  G03F7/70758 ,  G03F7/70825

Abstract: A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.