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公开(公告)号：US20200218167A1
公开(公告)日：2020-07-09
申请号：US16826479
申请日：2020-03-23
Applicant: ASML Netherlands B.V.
Abstract: A metrology apparatus for and a method of determining a characteristic of interest relating to at least one structure on a substrate. The metrology apparatus comprises a sensor and an optical system. The sensor is for detecting characteristics of radiation impinging on the sensor. The optical system comprises an illumination path and a detection path. The optical system is configured to illuminate the at least one structure with radiation received from a source via the illumination path. The optical system is configured to receive radiation scattered by the at least one structure and to transmit the received radiation to the sensor via the detection path.
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公开(公告)号：US20230393490A1
公开(公告)日：2023-12-07
申请号：US18453531
申请日：2023-08-22
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70633 , G03F7/70625 , G03F7/70608 , G01N21/211 , G03F7/70683 , G03F9/7088 , G01N21/47 , G03F7/70641
Abstract: A computer program product causes a processor to execute a process of causing an optical system to illuminate at least one structure on a substrate that comprises first repetitive features at a first pitch in a first layer and second repetitive features at a second pitch in a second layer, the first repetitive features at least partially overlapping with the second repetitive features. The first pitch is different from the second pitch. The processor causes the optical system to receive radiation scattered by the at least one structure and transmit a portion of the received scattered radiation to a sensor arranged in an image plane of the optical system or in a plane conjugate with the image plane for detecting the received scattered radiation and configured to detect a characteristic of radiation impinging on the sensor. The processor then determines a characteristic of interest of the structure.
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