公开(公告)号：US20180067398A1

公开(公告)日：2018-03-08

申请号：US15314841

申请日：2015-05-07

Applicant: ASML Netherlands B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Christianus Wilhelmus Berendsen ,  Andre Bernardus Jeunink ,  Adrianus Hendrik Koevoets ,  Jim Vincent Overkamp ,  Sigfried Alexander Tromp ,  Van Vuong Vy ,  Daniel Elza Roeland Audenaerdt

IPC: G03F7/20

CPC classification number: G03F7/7095 ,  G03F7/70341 ,  G03F7/70733 ,  G03F7/70875 ,  G03F7/70891

Abstract: A lithographic apparatus comprising: a channel (46) for the passage therethrough of a two phase flow, wherein the channel is formed within a block, the block being of a first material (100); a second material (160) between the first material and the channel, wherein the second material has a specific heat capacity higher than that of the first material; and a third material (90) between the second material and the channel, wherein the third material has a thermal conductivity higher than that of the second material.