公开(公告)号：US20240184222A1

公开(公告)日：2024-06-06

申请号：US18443827

申请日：2024-02-16

Applicant: ASML Netherlands B.V.

Inventor： Guido DE HAAN ,  Stephen EDWARD ,  Thomas Jan VAN DEN HOOVEN ,  Paulus Clemens Maria PLANKEN ,  Irwan Dani SETIJA

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7069 ,  G03F9/7084

Abstract: Disclosed is a method for measuring a target located on a substrate beneath at least one layer. The method comprises exciting said at least one layer with pump radiation comprising at least one pump wavelength, so as to generate an acoustic wave within said at least one layer which reflects of said target thereby generating an acoustic replica of said target at a surface of said substrate and illuminating said acoustic replica with probe radiation comprising at least one probe wavelength and capturing the resultant scattered probe radiation, scattered from the acoustic replica. One or both of said exciting step and said illuminating step comprises generating Surface Plasmon Polaritons (SPPs) on residual topography of said at least one layer resultant from said target.

公开(公告)号：US20240377765A1

公开(公告)日：2024-11-14

申请号：US18286486

申请日：2022-03-31

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Stephen EDWARD ,  Sjoerd Nicolaas Lambertus DONDERS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  David Q'DWYER ,  Andrey NIKIPELOV ,  Gosse Charies DE VRIES

IPC: G03F7/00 ,  G02F1/35

Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：US20190354026A1

公开(公告)日：2019-11-21

申请号：US16478068

申请日：2018-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Stefan Michiel WITTE ,  Alessandro ANTONCECCHI ,  Stephen EDWARD ,  Hao ZHANG ,  Paulus Clemens Maria PLANKEN ,  Kjeld Sijbrand Eduard EIKEMA ,  Sebastianus Adrianus GOORDEN ,  Simon Reinald HUISMAN ,  Irwan Dani SETIJA

IPC: G03F9/00 ,  G01B11/24 ,  G01B17/06

Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.