公开(公告)号：US11942340B2

公开(公告)日：2024-03-26

申请号：US17811047

申请日：2022-07-06

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard Gosen ,  Te-Yu Chen ,  Dennis Herman Caspar Van Banning ,  Edwin Cornelis Kadijk ,  Martijn Petrus Christianus Van Heumen ,  Erheng Wang ,  Johannes Andreas Henricus Maria Jacobs

IPC: H01L21/67 ,  G03F7/00

CPC classification number: H01L21/67201 ,  G03F7/70841 ,  G03F7/70858 ,  H01L21/67098

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

公开(公告)号：US11430678B2

公开(公告)日：2022-08-30

申请号：US16514843

申请日：2019-07-17

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard Gosen ,  Te-Yu Chen ,  Dennis Herman Caspar Van Banning ,  Edwin Cornelis Kadijk ,  Martijn Petrus Christianus Van Heumen ,  Erheng Wang ,  Johannes Andreas Henricus Maria Jacobs

IPC: H01L21/67 ,  G03F7/20

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.