公开(公告)号：US20150034788A1

公开(公告)日：2015-02-05

申请号：US14382228

申请日：2013-01-30

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan Bleeker ,  Thomas Josephus Maria Castenmill ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beere ,  Roger Anton Marie Timmermans

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。