公开(公告)号：US09881764B2

公开(公告)日：2018-01-30

申请号：US15255314

申请日：2016-09-02

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears ,  Douglas Larson

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/04 ,  H01J37/21 ,  H01J37/147

CPC classification number: H01J37/045 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0451 ,  H01J2237/0492 ,  H01J2237/1505 ,  H01J2237/24592

Abstract: An electron beam apparatus addresses blanking issues resulting from sinking high-power heat onto an aperture diaphragm by evenly spreading heat on the aperture diaphragm. The apparatus can include an aperture diaphragm and a deflector that deflects the electron beam on the aperture diaphragm. The electron beam is directed at the aperture diaphragm in a pattern around the aperture. The pattern may be a circle, square, or polygon. The pattern also may include a variable locus relative to the aperture.

公开(公告)号：US20230274906A1

公开(公告)日：2023-08-31

申请号：US17901767

申请日：2022-09-01

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus, Maria, Johannes MAASSEN ,  Joost Jeroen OTTENS ,  Long MA ,  Youfei JIANG ,  Weihua YIN ,  Wei-Te LI ,  Xuedong LIU

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/1474 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/1505 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US20160181058A1

公开(公告)日：2016-06-23

申请号：US14976090

申请日：2015-12-21

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Katja Tsyrulin ,  Roland Salzer

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/28 ,  H01J37/302 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/1505 ,  H01J2237/1508 ,  H01J2237/2801 ,  H01J2237/30488 ,  H01J2237/317 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method is provided for processing and/or observing an object using at least one particle beam that is scanned over the object. A scan region on the object is determined, the scan region having scan lines, and the particle beam is moved in a first scanning direction along one of the scan lines. The first scanning direction is changed to a second scanning direction at a change-of-direction time. Changing from the first scanning direction to the second scanning direction comprises setting of a point of rotation in that scan line of the scan region in which the particle beam is situated at the change-of-direction time, with an axis of rotation extending through the point of rotation. The first scanning direction is changed into the second scanning direction by rotating the scan region about the axis of rotation, with the point of rotation being selected dependent on the direction of rotation.

公开(公告)号：US20150255248A1

公开(公告)日：2015-09-10

申请号：US14642138

申请日：2015-03-09

Applicant: Dimitry BOGUSLAVSKY ,  Mark KOVLER

Inventor： Dimitry BOGUSLAVSKY ,  Mark KOVLER

IPC: H01J37/305 ,  G01N1/32

CPC classification number: H01J37/3056 ,  G01N1/32 ,  H01J37/147 ,  H01J37/20 ,  H01J2237/0245 ,  H01J2237/0827 ,  H01J2237/1505 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods, apparatuses, systems and software for ion beam milling or machining are disclosed. The apparatus includes a specimen holder, a table, one or more ion sources, rotatable ion optics, and an imaging device. The specimen holder is configured to hold a specimen in a stationary position during milling or machining. The table is configured to change the stationary position of the specimen holder in any of three orthogonal linear directions and an angular direction. The rotatable ion optics are configured to emit an ion beam towards a predetermined location on the specimen from any of the one or more ion sources at any angle around an axis that is orthogonal to a horizontal surface of the table when the angular direction of the table is 0°. The imaging device is configured to generate an image of the specimen including the predetermined location, thereby enabling real-time monitoring of the milling or machining process.

Abstract translation: 公开了用于离子束铣削或加工的方法，装置，系统和软件。 该装置包括样本保持器，台，一个或多个离子源，可旋转的离子光学器件和成像装置。 样品架被配置成在铣削或加工过程中将样品保持在静止位置。 该台被配置为在三个正交的线性方向和角度方向中的任一个中改变样本保持器的静止位置。 可旋转离子光学器件被配置为当表的角度方向与表的水平表面垂直的轴线以任何角度从任何一个或多个离子源发射离子束到样品上的预定位置 是0°。 成像装置被配置为生成包括预定位置的样本的图像，从而能够实时地监视铣削或加工过程。

公开(公告)号：US20100320393A1

公开(公告)日：2010-12-23

申请号：US12489873

申请日：2009-06-23

Applicant: Thomas Robert Albrecht ,  Jeffrey S. Lille

Inventor： Thomas Robert Albrecht ,  Jeffrey S. Lille

IPC: H01J3/26

CPC classification number: H01J3/34 ,  H01J37/1472 ,  H01J2237/1505 ,  H01J2237/24528 ,  H01J2237/31701

Abstract: A tool for patterning a disk such as a magnetic media disk for use in a disk drive system. The tool includes a chamber and a first and second series of magnets, each evenly spaced about the chamber wall. An ion beam source at an end of the chamber emits an ion beam toward the disk which is held within the chamber. The first series of magnets deflect the ion beam away from center and toward the chamber wall. The second ion beam source deflects the ion beam back toward the center so that the ion beam can strike the disk at an angle. In addition, to bending the ion beam, the magnets also rotate the bent ion beam so the movement of the ion beam revolves within the chamber.

Abstract translation: 用于图案化磁盘的工具，例如用于磁盘驱动器系统的磁性介质盘。 该工具包括腔室和第一和第二系列磁体，每个磁体均匀地间隔开室壁。 在室的端部处的离子束源朝向盘保持在腔室内的离子束发射。 第一系列磁体使离子束远离中心并朝向室壁偏转。 第二离子束源将离子束偏转回中心，使得离子束以一定角度撞击盘。 此外，为了弯曲离子束，磁体还使弯曲的离子束旋转，使得离子束的运动在室内旋转。

公开(公告)号：US20230260744A1

公开(公告)日：2023-08-17

申请号：US17974702

申请日：2022-10-27

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Heiko Stegmann

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/145 ,  H01J37/244 ,  H01J37/304 ,  G01N23/2251 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/226 ,  H01J37/145 ,  H01J37/244 ,  H01J37/304 ,  G01N23/2251 ,  H01J37/1475 ,  H01J37/1477 ,  H01J2237/1505

Abstract: The invention relates to a method for producing a sample on an object using a material processing device. The invention further relates to a computer program product and a material processing device for carrying out the method. The method comprises guiding a light beam over a surface of the object in a first direction along a first line, with material of the object being ablated when the light beam is guided over the surface of the object, changing the first direction into a second direction, guiding the light beam over the surface of the object in the second direction along a second line, with material of the object being ablated when the light beam is guided over the surface of the object along the second line, wherein the light beam is provided in pulsed fashion and is guided onto the surface of the object in such a way that the light beam ablates material from the object in a first operational state of the light beam device and that the light beam is not guided onto the object in a second operational state, and wherein the sample is produced in the first operational state by ablating material from the object.

公开(公告)号：US09406496B2

公开(公告)日：2016-08-02

申请号：US13681245

申请日：2012-11-19

Applicant: Universitat de Barcelona ,  Nanomegas SPRL ,  AppFive LLC

Inventor： Sonia Estrade Albiol ,  Joaquin Portillo Serra ,  Francisca Peiró Martinez ,  José Manuel Rebled Corsellas ,  Lluís Yedra Cardona ,  Stavros Nicolopoulos ,  Steven Kim ,  Jon Karl Weiss

IPC: G01N23/225 ,  H01J49/44 ,  H01J37/28

CPC classification number: H01J49/44 ,  G01N23/2251 ,  G01N2223/051 ,  G01N2223/402 ,  H01J37/28 ,  H01J2237/1505 ,  H01J2237/1506 ,  H01J2237/1507 ,  H01J2237/2808

Abstract: A method and system are disclosed for improving characteristic peak signals in electron energy loss spectroscopy (EELS) and energy dispersive x-ray spectroscopy (EDS) measurements of crystalline materials. A beam scanning protocol is applied which varies the inclination, azimuthal angle, or a combination thereof of the incident beam while spectroscopic data is acquired. The method and system may be applied to compositional mapping.

Abstract translation: 公开了用于改善电子能量损失光谱（EELS）中的特征峰值信号和结晶材料的能量色散X射线光谱（EDS）测量的方法和系统。 应用波束扫描协议，其在获取光谱数据的同时改变入射光束的倾斜度，方位角或其组合。 该方法和系统可以应用于组合映射。

公开(公告)号：US20140197734A1

公开(公告)日：2014-07-17

申请号：US14127111

申请日：2012-06-04

Applicant: Tuneo Yasue ,  Takanori Kosikawa ,  Katsusige Tuno

Inventor： Tuneo Yasue ,  Takanori Kosikawa ,  Katsusige Tuno

IPC: H01J1/50 ,  H01J3/22

CPC classification number: H01J1/50 ,  H01J3/22 ,  H01J37/145 ,  H01J37/26 ,  H01J2237/041 ,  H01J2237/1505

Abstract: A spin device includes: a first condenser lens which focuses a spin polarized electron beam discharged from an electron gun or reflected on a sample; a spin rotator which includes a multipole having a point to which the electron beam is focused by the first condenser lens at a lens center or in the vicinity of the lens center and being capable of generating an electric field and a magnetic field; a Wien condition generating means which applies a voltage and a current which satisfy the Wien condition for rotating spin of the electron beam by a designated angle and making the electron beam advance straightly to the multipole which constitutes the spin rotator; and a second condenser lens which focuses the electron beam whose spin is rotated by the spin rotator.

Abstract translation: 旋转装置包括：第一聚光透镜，其聚焦从电子枪放射或反射在样品上的自旋极化电子束; 旋转旋转器，其包括具有电子束在透镜中心或透镜中心附近被第一聚光透镜聚焦的点的多极，并且能够产生电场和磁场; 维纳条件产生装置，其施加满足用于使电子束的旋转旋转指定角度的维恩条件的电压和电流，并使电子束直线前进到构成旋转旋转器的多极; 以及第二聚光透镜，其聚焦其自旋由旋转旋转器旋转的电子束。

公开(公告)号：US5663568A

公开(公告)日：1997-09-02

申请号：US546078

申请日：1995-10-20

Applicant: Warren Kazmir Waskiewicz

Inventor： Warren Kazmir Waskiewicz

IPC: G03F7/20 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3045 ,  H01J37/3175 ,  H01J2237/1505 ,  H01J2237/3045 ,  H01J2237/31776

Abstract: An apparatus and process in which a particle beam is used to introduce a pattern into an energy sensitive material is disclosed. A coil assembly is used to selectively control both the orientation of the particle beam relative to the substrate on which the energy sensitive material is applied and the magnification or demagnification of the image in the particle beam. The coil assembly comprises at least two coils. The particle beam is projected through the coil assembly. The coil assembly is used to rotate the particle beam to compensate for an observed difference between the actual substrate orientation and the desired substrate orientation. The coils in the coil assembly are excited so that the desired rotation is introduced into the particle beam by the cumulative effects of the magnetic fields generated by the excited coils in the coil assembly. The coils in the coil assembly are calibrated such that the desired amount of beam rotation is provided by the coil assembly without introducing unwanted lens effects into the beam. The coils are also used to introduce a desired lens effect, such as magnification of demagnification, into the particle beam without introducing unwanted rotation into the beam. In another embodiment, the coils are used to introduce a desired lens effect, such as magnification or demagnification, into the particle beam without introducing unwanted rotation into the beam.

Abstract translation: 公开了一种使用粒子束将图案引入能量敏感材料的装置和方法。 线圈组件用于选择性地控制颗粒束相对于其上施加能量敏感材料的基底的取向，以及粒子束中的图像的放大或缩小。 线圈组件包括至少两个线圈。 粒子束通过线圈组件突出。 线圈组件用于旋转粒子束以补偿实际衬底取向和期望衬底取向之间的观察到的差异。 线圈组件中的线圈被激励，使得期望的旋转通过由线圈组件中的受激线圈产生的磁场的累积效应被引入到粒子束中。 线圈组件中的线圈被校准，使得所需量的光束旋转由线圈组件提供，而不会将不需要的透镜效应引入到光束中。 线圈还用于将不期望的透镜效应（例如放大缩小）引入到粒子束中，而不会将不期望的旋转引入到光束中。 在另一个实施例中，线圈用于将期望的透镜效应（例如放大或缩小）引入到颗粒束中，而不会将不期望的旋转引入到光束中。

公开(公告)号：US5311026A

公开(公告)日：1994-05-10

申请号：US858575

申请日：1992-03-27

Applicant: Norio Saitou ,  Yoshihiko Okamoto ,  Takashi Yamazaki ,  Hideo Todokoro

Inventor： Norio Saitou ,  Yoshihiko Okamoto ,  Takashi Yamazaki ,  Hideo Todokoro

IPC: H01L21/027 ,  H01J37/304

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J2237/1505 ,  H01J2237/3045 ,  H01J2237/31776

Abstract: The present invention relates to a system for drawing patterns on a wafer by using a charged particle beam such as an electron beam, in which a complicated prealigning mechanism used for mounting the wafer on a stage is omitted. Instead, according to the present system, rotation of the wafer is detected and a shaped beam is rotated by an amount corresponding to the value detected. Subsequently, a predetermined pattern is drawn on the substrate. The system includes a detecting device for detecting the rotation of the wafer by using an orientation flat or adjusting marks; a computer for storing a value corresponding to the rotation thus detected; a rotating lens control circuit for receiving data from the computer; and a rotating lens.

Abstract translation: 本发明涉及一种通过使用诸如电子束的带电粒子束在晶片上绘制图形的系统，其中省略了用于将晶片安装在平台上的复杂预对准机构。 相反，根据本系统，检测晶片的旋转，并且将成形光束旋转与所检测的值对应的量。 随后，在衬底上绘制预定图案。 该系统包括用于通过使用取向平面或调整标记来检测晶片的旋转的检测装置; 用于存储与所检测的旋转对应的值的计算机; 用于从计算机接收数据的旋转透镜控制电路; 和旋转透镜。