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公开(公告)号:US10768025B2
公开(公告)日:2020-09-08
申请号:US15524263
申请日:2015-10-22
Applicant: ASML NETHERLANDS B.V.
Inventor: Wouter Onno Pril , Jan Peter Baartman , Allard Eelco Kooiker , Suzanne Johanna Antonetta Geertruda Cosijns , Bryan Tong-Minh
Abstract: An encoder includes an optical component and an enclosing device having a first surface portion and a second surface portion. The first surface portion is arranged to receive from an ambient environment a first radiation beam. The second surface portion is arranged to receive from the ambient environment a second radiation beam. The optical component is arranged to combine the first and second radiation beams. The enclosing device is arranged to propagate the first radiation beam along a first path. The first path is between the first surface portion and the optical component. The enclosing device is arranged to propagate the second radiation beam along a second path. The second path is between the second surface portion and the optical component. The enclosing device is arranged to enclose a space, so as to isolate the first path and the second path from the ambient environment.
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公开(公告)号:US11476077B2
公开(公告)日:2022-10-18
申请号:US16840297
申请日:2020-04-03
Applicant: ASML Netherlands B.V.
Inventor: Marcel Koenraad Marie Baggen , Wouter Onno Pril , Engelbertus Antonius Fransiscus Van Der Pasch
IPC: H01J37/20 , H01J37/24 , H01J37/317 , H01J37/244
Abstract: A stage apparatus for an e-beam inspection apparatus comprising: an object table (3) comprising an supporting surface, the object table configured to support a substrate (190) on the supporting surface; a positioning device (180) configured to a position the object table; a position measurement system (5) comprising a position sensor (8-10) configured to measure a height position of the object table parallel to a first axis, the first axis being substantially perpendicular to the supporting surface, the position sensor comprising an interferometer measurement system having an interferometer sensor (9, 10, 22), wherein a measurement beam (11, 15) of the interferometer sensor is configured to irradiate a reflective surface (13, 17) of the object table in a measurement direction, the measurement direction having a first component parallel to the first axis and a second component parallel to a second axis, the second axis being substantially perpendicular to the first axis.
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