-
公开(公告)号:US20180201736A1
公开(公告)日:2018-07-19
申请号:US15567846
申请日:2016-03-23
发明人: Shinji KAWATO
IPC分类号: C08G77/62 , C08K5/544 , C08K5/5425 , C08K5/5419 , C08L83/16 , C08J5/18 , C08J3/28 , C09D183/16 , C09D183/14
CPC分类号: C08G77/62 , C08J3/28 , C08J5/18 , C08J2383/16 , C08K5/5419 , C08K5/5425 , C08K5/544 , C08L83/16 , C08L2201/14 , C08L2203/16 , C09D183/14 , C09D183/16 , C08L83/00
摘要: [Problem] To provide a composition for forming a coating layer having excellent gas barrier performance and a method of forming the coating layer. [Means for Solution] A composition for forming a coating film comprising a specific silicon compound which reacts with a polysilazane by exposure, a polysilazane and an organic solvent, and a method for forming a coating layer comprising coating the composition on a substrate and exposing.