公开(公告)号：US20180312641A1

公开(公告)日：2018-11-01

申请号：US15771477

申请日：2016-10-04

申请人： AZ Electronic Materials (Luxembourg) S.a.r.l.

发明人： Ralf GROTTENMÜLLER ,  Abraham CASAS GARCIA-MINGUILLAN ,  Fumio KITA ,  Dieter WAGNER

IPC分类号： C08G77/62 ,  C08G77/16 ,  C08G77/24 ,  C09D183/16 ,  C09D183/06 ,  H01L33/56 ,  H01L33/50

CPC分类号： C08G77/62 ,  C08G77/16 ,  C08G77/24 ,  C08G77/452 ,  C08G77/54 ,  C08G77/70 ,  C08K3/28 ,  C08K5/5406 ,  C08K5/544 ,  C08L83/04 ,  C08L83/08 ,  C09D183/06 ,  C09D183/16 ,  H01L23/296 ,  H01L33/502 ,  H01L33/56 ,  H01L2933/0025 ,  H01L2933/0033 ,  H01L2933/0041 ,  H01L2933/005

摘要： The present invention relates to a method for producing silazane-siloxa copolymers and the use of such copolymers, particularly in LEDs.

公开(公告)号：US09963596B2

公开(公告)日：2018-05-08

申请号：US15432567

申请日：2017-02-14

申请人： Allied Bioscience, Inc.

发明人： Daniel Moros ,  Craig Grossman ,  Gavri Grossman

IPC分类号： C09D183/08 ,  C09D5/14 ,  C08G77/26 ,  B05D1/02

CPC分类号： C09D5/14 ,  B05D1/02 ,  C08G73/0246 ,  C08G77/26 ,  C08G77/62 ,  C08K3/22 ,  C08K2003/2241 ,  C09D183/08 ,  C09D183/16 ,  C08L83/14

摘要： The invention relates to an antimicrobial coating composition formed by admixing choline bitartrate or choline chloride, an aminopropyltrialkoxysilane and water. This coating composition is preferably sprayed onto a surface and allowed to dry. Preferably the surface is a stainless steel surface. The coating reduces the amount of E. Coli on the surface of the substrate.

公开(公告)号：US20170131591A1

公开(公告)日：2017-05-11

申请号：US15319818

申请日：2015-06-22

申请人： INKRON OY

发明人： Juha RANTALA ,  Jarkko HEIKKINEN ,  Janne KYLMA

IPC分类号： G02F1/1333 ,  H01L27/32 ,  H01L51/52 ,  C09D183/06 ,  C09J9/00 ,  C09D7/12 ,  C09D5/00 ,  C09J7/00 ,  C09J11/04 ,  G06F3/044 ,  C08G77/00

CPC分类号： G02F1/133345 ,  C08G77/14 ,  C08G77/18 ,  C08G77/20 ,  C08G77/62 ,  C08G77/80 ,  C08K3/22 ,  C08K3/28 ,  C08K2003/2244 ,  C08K2201/005 ,  C08L83/00 ,  C08L83/06 ,  C09D5/00 ,  C09D7/61 ,  C09D7/67 ,  C09D183/06 ,  C09J7/00 ,  C09J9/00 ,  C09J11/04 ,  C09J183/06 ,  G02F1/13338 ,  G02F2202/023 ,  G02F2202/28 ,  G02F2202/36 ,  G06F3/0412 ,  G06F3/044 ,  H01L27/323 ,  H01L33/56 ,  H01L51/5246 ,  H01L2251/30 ,  H01L2251/5369

摘要： A method for making a dielectric film includes a substrate on which is deposited a siloxane starting material and particles, wherein the siloxane starting material has a siloxane polymer, a siloxane oligomer and/or silane monomers, and wherein the particles have an average particle size of less than 400 nm. After deposition, heat and/or electromagnetic energy is applied to the siloxane particle layer so as to cure the layer and form a dielectric film on the substrate. The formed film is optically transmissive to visible light and transmits at least 80% of the visible light incident thereon, and is electrically insulating and has a sheet resistance of 1000 Ω/sq or more.

公开(公告)号：US20170107401A1

公开(公告)日：2017-04-20

申请号：US15395642

申请日：2016-12-30

申请人： Burning Bush Group, LLC

发明人： Chris Fish

IPC分类号： C09D183/16 ,  C09D5/32 ,  B05D3/00 ,  C09D183/04 ,  C09D183/00 ,  C09D5/00 ,  C09D5/08 ,  C09D5/24

CPC分类号： C09D183/16 ,  B05D3/007 ,  B05D5/08 ,  C08G77/04 ,  C08G77/60 ,  C08G77/62 ,  C08L83/16 ,  C09D5/00 ,  C09D5/08 ,  C09D5/24 ,  C09D5/32 ,  C09D183/00 ,  C09D183/04 ,  C09D183/10 ,  C09D183/14 ,  C08L83/00

摘要： Provided herein is a method for coating a surface. The method comprises providing a towelette moistened with a mixture of constituents to form a non-aqueous silicon-based composition comprising 7% to 80% (w/w of the total composition) polysilazane, 1% to 10% (w/w of the total composition) polysilane, 0.2% to 1% (w/w of the total composition) polysiloxane, and 20% to 70% (w/w of the total composition) at least one organic solvent; wherein polysilazane is present in a 10:1 to 110:1 weight ratio to polysiloxane; and wherein the polysilane is of a formula (R1R2Si)n, wherein n is greater than 1, and wherein R1 and R2 are the same or different and are chosen from alkyl, alkenyl, cycloalkyl, alkylamino, aryl, aralkyl, or alkylsilyl. The mixture from the towelette to form a coating on a surface and the coating is cured ambiently without additional heat. Also provided are towelettes containing the mixture.

公开(公告)号：US20160379817A1

公开(公告)日：2016-12-29

申请号：US15039440

申请日：2014-12-08

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.I.

发明人： Toshiya OKAMURA ,  Takashi KANDA ,  Issei SAKURAI ,  Bertram Bernd BARNICKEL ,  Hiroyuki AOKI

IPC分类号： H01L21/02 ,  C09D1/00 ,  C01B21/087

CPC分类号： H01L21/02222 ,  C01B21/087 ,  C08G77/62 ,  C09D1/00 ,  H01L21/02164 ,  H01L21/02282

摘要： [Problem] To provide a perhydropolysilazane making it possible to form a siliceous film with minimal defects, and a curing composition comprising the perhydropolysilazane.[Means for Solution] The present invention provides a perhydropolysilazane having a weight-average molecular weight of 5,000 to 17,000, characterized in that when 1H-NMR of a 17% by weight solution of said perhydropolysilazane dissolved in xylol is measured, the ratio of the amount of SiH1,2 based on the aromatic ring hydrogen content of the xylol is 0.235 or less and the ratio of the amount of NH based on the aromatic ring hydrogen content of the xylol is 0.055 or less, and a curing composition comprising the perhydropolysilazane. The present invention also provides a method for forming a siliceous film, comprising coating the curing composition on a substrate and heating.

摘要翻译： [解决方案]本发明提供重均分子量为5,000〜17,000的全氢聚硅氮烷，其特征在于，测定17重量％的所述全氢聚硅氮烷溶解在二甲苯中的溶液的1H-NMR， 基于二甲苯的芳环氢含量的SiH1.2的量为0.235或更小，并且基于二羟甲基的芳环氢含量的NH的量的比例为0.055或更小，以及包含全氢聚硅氮烷的固化组合物。 本发明还提供一种形成硅质膜的方法，其包括将固化组合物涂覆在基材上并加热。

公开(公告)号：US20160362580A1

公开(公告)日：2016-12-15

申请号：US15120936

申请日：2015-02-27

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： Ralf GROTTENMÜLLER ,  Rosalin KARUNANANDAN ,  Fumio KITA ,  Helmut LENZ ,  Dieter WAGNER ,  Andreas DRESEL

IPC分类号： C09D183/16 ,  C08G77/62 ,  C08J3/24 ,  H01L33/56 ,  C09D7/12

CPC分类号： C09D183/16 ,  C08G77/62 ,  C08G2190/00 ,  C08J3/247 ,  C08J2383/16 ,  C08K3/013 ,  C08K3/22 ,  C08K3/36 ,  C08K9/04 ,  C08K9/06 ,  C08K2003/2241 ,  C08K2003/2244 ,  C08K2201/003 ,  C08K2201/011 ,  C09D7/62 ,  C09D7/67 ,  H01L33/52 ,  H01L33/56 ,  H01L2933/005 ,  C08L83/16 ,  C08K3/0033

摘要： A hybrid material for light emitting diodes, comprising a) an organopolysilazane material, comprising repeating units of formulae (I) and (II) [—SiR1R2—NR3—]x  (I) [—SiHR4—NR5—]y  (II) wherein the symbols and indices have the following meanings: R1 is C2-C6-alkenyl or C4-C6-alkadienyl; R2 is H or an organic group; R3 is H or an organic group; R4 is H or an organic group; R5 is H or an organic group; x is 0.001 to 0.2; and y is 2x to (1−x), with the proviso that x+y≦1 and that y can be 0 if R2 is H, and b) inorganic nanoparticles having a mean diameter in the range of from 1 to 30 nm, which are surface modified with a capping agent comprising a C1-C18-alkyl and/or C1-C18-alkenyl group, is useful as encapsulation material for LEDs.

公开(公告)号：US09505949B2

公开(公告)日：2016-11-29

申请号：US14641748

申请日：2015-03-09

申请人： Burning Bush Group, LLC

发明人： Chris Fish

IPC分类号： C09D183/04 ,  C08L83/04 ,  B05D3/02 ,  C08G77/04

CPC分类号： C09D183/04 ,  B05D3/0254 ,  B29C70/34 ,  B29C70/462 ,  B29K2083/00 ,  B29K2105/124 ,  C08G77/04 ,  C08G77/62 ,  C08K3/04 ,  C08K3/38 ,  C08K2003/385 ,  C08L83/00 ,  C08L83/04 ,  C08L83/16 ,  C09D183/08 ,  C09D183/16 ,  Y10T156/1044 ,  Y10T428/1372 ,  Y10T428/25 ,  Y10T442/20 ,  Y10T442/2984

摘要： Provided herein are silicon-based compositions, which after curing is a coating composition having strong substrate adhesion and scratch resistance. The compositions are formed from a mixture of constituents comprising: from about 20% to about 90% (w/w) of a first siloxane selected from the group consisting of silsesquioxane, methylmethoxysiloxane, and combinations thereof; and from about 10% to about 80% (w/w) of one or more silicon compounds selected from the group consisting of a second siloxane, silane, and silazane. Optionally, the compositions may comprise from about 0.1% to about 5% (w/w) alkyltitanate.

公开(公告)号：US20160280724A1

公开(公告)日：2016-09-29

申请号：US15070693

申请日：2016-03-15

申请人： Gelest Technologies, Inc.

发明人： Barry C. ARKLES ,  Youlin PAN ,  Fernando JOVE

IPC分类号： C07F7/21 ,  C08G77/62 ,  C01B21/068 ,  C07F7/02

CPC分类号： C07F7/21 ,  C01B21/068 ,  C07F7/025 ,  C08G77/62 ,  H01L21/0217 ,  H01L21/02219 ,  H01L21/02222 ,  H01L21/02271 ,  H01L21/02274

摘要： Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.

摘要翻译： 提供新的N-烷基取代的全氢化环硅氮烷，低聚N-烷基过氢化硅氮烷化合物和N-烷基氨基二氢卤代硅烷，以及它们的合成方法。 新型化合物可用于通过热或等离子体诱导的分解形成高氮化硅含量的膜。

公开(公告)号：US20160122587A1

公开(公告)日：2016-05-05

申请号：US14932840

申请日：2015-11-04

申请人： Daniel Moros ,  Craig Grossman ,  Gavri Grossman

发明人： Daniel Moros ,  Craig Grossman ,  Gavri Grossman

IPC分类号： C09D183/08 ,  B05D7/00 ,  C08G77/26

CPC分类号： C09D5/14 ,  B05D1/02 ,  C08G73/0246 ,  C08G77/26 ,  C08G77/62 ,  C08K3/22 ,  C08K2003/2241 ,  C09D183/08 ,  C09D183/16 ,  C08L83/14

摘要： A polymeric material formed by reacting aminopolyol having a structure: wherein R4 is selected from the group consisting of —H and —CH2—CH2—OH; and an organosilane, wherein said organosilane has a structure: wherein R1 is selected from the group consisting of —H, —CH3 and —CH2—CH3 and R2 is selected from the group consisting of —OH, —O—CH3, O—CH2—CH3, alkyl, alkyl with a chlorine moiety, alkyl with an amino moiety, and alkyl with a quaternary ammonium group.

摘要翻译： 通过使具有以下结构的氨基多元醇反应形成的聚合物材料：其中R 4选自-H和-CH 2 -CH 2 -OH; 和有机硅烷，其中所述有机硅烷具有以下结构：其中R 1选自-H，-CH 3和-CH 2 -CH 3，R 2选自-OH，-O-CH 3，O-CH 2 -CH 3，烷基，具有氯部分的烷基，具有氨基部分的烷基和具有季铵基团的烷基。

公开(公告)号：US20160108282A1

公开(公告)日：2016-04-21

申请号：US14893824

申请日：2014-05-26

申请人： KONICA MINOLTA, INC.

发明人： Hirohide ITO

IPC分类号： C09D183/14 ,  C23C16/48 ,  C09D183/06 ,  C23C16/22

CPC分类号： C09D183/14 ,  B32B15/08 ,  B32B2457/00 ,  C08G77/62 ,  C08J7/042 ,  C08J7/123 ,  C08J2367/02 ,  C08J2483/04 ,  C08J2483/16 ,  C09D183/06 ,  C09D183/16 ,  C23C16/22 ,  C23C16/48 ,  H01L51/5253 ,  H05B33/04

摘要： [Object] To provide a means capable of further improving gas barrier capabilities and durability of gas barrier capabilities for a gas barrier film.[Solving Means] A gas barrier film having: a substrate; a first barrier layer that is arranged on at least one surface of the substrate, has a film density of 1.5 to 2.1 g/cm3, and includes an inorganic compound; and a second barrier layer that is formed on the surface of the substrate on the same side where the first barrier layer is formed and includes silicon atoms, oxygen atoms, and at least one added element selected from the group consisting of elements of Groups 2-14 of the long form of the periodic table (excluding silicon and carbon), the abundance ratio of oxygen atoms to silicon atoms (O/Si) being 1.4 to 2.2, and the abundance ratio of nitrogen atoms to silicon atoms (N/Si) being 0 to 0.4.

摘要翻译： 提供能够进一步提高气体阻隔性能的气体阻隔性能和耐气体阻隔性能的耐久性的手段。 [解决方案]一种阻气膜，具有：基材; 布置在基板的至少一个表面上的第一阻挡层具有1.5至2.1g / cm 3的膜密度，并且包括无机化合物; 以及第二阻挡层，其形成在与形成有第一阻挡层的同一侧的基板的表面上，并且包括硅原子，氧原子和至少一种添加元素，所述添加元素选自2- 14周期表（不包括硅和碳），氧原子与硅原子（O / Si）的丰度比为1.4〜2.2，氮原子与硅原子的丰度比（N / Si） 为0至0.4。