公开(公告)号：US20190197675A1

公开(公告)日：2019-06-27

申请号：US16185133

申请日：2018-11-09

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Chien-Li Chen ,  Yu-Ho Ni ,  Chien-Cheng Kuo ,  Te-min Wang

IPC: G06T7/00 ,  H01L21/68 ,  G06T7/73

CPC classification number: G06T7/001 ,  G06T7/74 ,  G06T2207/30164 ,  H01L21/681

Abstract: A method for calibrating element in a semiconductor processing device with a camera is provided. The method for calibrating element in a semiconductor processing device with a camera includes taking a first picture of a first element by a camera; providing a first actuator to move the first element an increment along a first direction; taking a second picture of the first element by the camera; and comparing the first picture and the second picture to calibrate the first element. A system for calibrating element in a semiconductor processing device with a camera is also provided.

公开(公告)号：US10984524B2

公开(公告)日：2021-04-20

申请号：US16185133

申请日：2018-11-09

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Chien-Li Chen ,  Yu-Ho Ni ,  Chien-Cheng Kuo ,  Te-min Wang

IPC: G06T7/00 ,  G06T7/73 ,  H01L21/68

Abstract: A method for calibrating element in a semiconductor processing device with a camera is provided. The method for calibrating element in a semiconductor processing device with a camera includes taking a first picture of a first element by a camera; providing a first actuator to move the first element an increment along a first direction; taking a second picture of the first element by the camera; and comparing the first picture and the second picture to calibrate the first element. A system for calibrating element in a semiconductor processing device with a camera is also provided.