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1.发明授权公开(公告)号：US09029280B2
公开(公告)日：2015-05-12
申请号：US13537906
申请日：2012-06-29
申请人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
摘要： A substrate for p-Si TFT flat panel displays made of a glass having a high low-temperature-viscosity characteristic temperature and manufactured while avoiding erosion/wear of a melting tank during melting through direct electrical heating. The glass substrate comprises 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-20 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-0.8 mass % of R2O, wherein R2O is total amount of Li2O, Na2O, and K2O, and 0-0.3 mass % of Sb2O3, and substantially does not comprise As2O3, wherein the mass ratio CaO/RO is equal to or greater than 0.65, the mass ratio (SiO2+Al2O3)/B2O3 is in a range of 7-30, and the mass ratio (SiO2+Al2O3)/RO is equal to or greater than 5. A related method involves melting glass raw materials blended to provide the glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
摘要翻译： 一种用于由具有高低温粘度特性温度的玻璃制成的p-Si TFT平板显示器的基板，并且在通过直接电加热熔化期间避免熔化槽的侵蚀/磨损而制造。 所述玻璃基板包含52-78质量％的SiO 2，3-25质量％的Al 2 O 3，3-15质量％的B 2 O 3，3-20质量％的RO，其中RO是MgO，CaO，SrO和BaO的总量 ，0.01-0.8质量％的R 2 O，其中，R 2 O为Li 2 O，Na 2 O，K 2 O的总量，Sb 2 O 3为0〜0.3质量％，基本上不包含As 2 O 3，CaO / （SiO2 + Al2O3）/ B2O3的质量比（SiO 2 + Al 2 O 3）/ B 2 O 3在7〜30的范围内，质量比（SiO 2 + Al 2 O 3）/ RO等于或大于5.相关方法包括将玻璃原料混合 提供玻璃组成; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。
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2.发明授权公开(公告)号：US08932969B2
公开(公告)日：2015-01-13
申请号：US13537774
申请日：2012-06-29
申请人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
CPC分类号： C03C3/091 , C03C3/093 , G02F2001/133302 , G02F2202/104
摘要： Provided are: a glass substrate for p-Si TFT flat panel displays that is composed of a glass having high characteristic temperatures in the low-temperature viscosity range, typified by the strain point and glass transition point, having a small heat shrinkage rate, and being capable of avoiding the occurrence of the problem regarding the erosion/wear of a melting tank at the time of melting through direct electrical heating; and a method for manufacturing same. The present glass substrate is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. The present method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
摘要翻译： 本发明提供：一种用于p-Si TFT平板显示器的玻璃基板，其由在低温粘度范围内具有高特征温度的玻璃构成，以应变点和玻璃化转变点为代表，具有小的热收缩率，以及 能够避免在通过直接电加热熔化时熔融槽的侵蚀/磨损的问题的发生; 及其制造方法。 本发明的玻璃基板由SiO 2为52〜78质量％，Al 2 O 3为3〜25质量％，B 2为3〜15质量％，RO为3〜25质量％的玻璃构成，其中，RO为MgO的总量， CaO，SrO，BaO，0.01〜1质量％的Fe 2 O 3和0〜0.3质量％的Sb 2 O 3，实质上不含有As 2 O 3，玻璃的质量比（SiO 2 + Al 2 O 3）/ B 2 O 3的范围为7〜30 以及等于或大于6的质量比（SiO 2 + Al 2 O 3）/ RO。本发明的玻璃基板的制造方法包括：通过使用至少直接电加热获得熔融玻璃的熔融步骤，玻璃原料 混合以提供上述玻璃组合物; 将熔融玻璃形成平板玻璃的成形工序; 以及退火平板玻璃的退火步骤。
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公开(公告)号：US08895461B2
公开(公告)日：2014-11-25
申请号：US13537774
申请日：2012-06-29
申请人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
摘要： Provided are: a glass substrate for p-Si TFT flat panel displays that is composed of a glass having high characteristic temperatures in the low-temperature viscosity range, typified by the strain point and glass transition point, having a small heat shrinkage rate, and being capable of avoiding the occurrence of the problem regarding the erosion/wear of a melting tank at the time of melting through direct electrical heating; and a method for manufacturing same. The present glass substrate is composed of a glass comprising 52-78 mass % of SiO2, 3-25 mass % of Al2O3, 3-15 mass % of B2O3, 3-25 mass % of RO, wherein RO is total amount of MgO, CaO, SrO, and BaO, 0.01-1 mass % of Fe2O3, and 0-0.3 mass % of Sb2O3, and substantially not comprising As2O3, the glass having a mass ratio (SiO2+Al2O3)/B2O3 in a range of 7-30 and a mass ratio (SiO2+Al2O3)/RO equal to or greater than 6. The present method for manufacturing a glass substrate involves: a melting step of obtaining a molten glass by melting, by employing at least direct electrical heating, glass raw materials blended so as to provide the aforementioned glass composition; a forming step of forming the molten glass into a flat-plate glass; and an annealing step of annealing the flat-plate glass.
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公开(公告)号：US20130023400A1
公开(公告)日：2013-01-24
申请号：US13537579
申请日：2012-06-29
申请人： Akihiro KOYAMA , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro KOYAMA , Satoshi Ami , Manabu Ichikawa
CPC分类号： C03C3/091 , C03C3/093 , G02F2001/133302 , H01L51/0096
摘要： A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3 and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.
摘要翻译： 根据本发明的平板显示器玻璃基板包括玻璃，其以摩尔％表示，55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3，3-25％RO（总量 MgO，CaO，SrO和BaO），并且基本上不含As2O3和Sb2O3。 玻璃的失透温度为1250℃以下。 玻璃基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的玻璃基板的收缩量，以10℃/分钟和550℃的升温和降温率通过热收缩率进行2小时计算 速率（ppm）= {热处理后的玻璃基板的收缩量/热处理前的玻璃基板的长度}×106。
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公开(公告)号：US09096459B2
公开(公告)日：2015-08-04
申请号：US13537615
申请日：2012-06-29
申请人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
IPC分类号： C03B25/00 , C03B17/00 , C03B17/06 , C03C3/091 , C03C3/093 , C03C3/064 , C03C3/066 , G02F1/1333
CPC分类号： C03C3/091 , C03B17/00 , C03B17/06 , C03B17/064 , C03B25/00 , C03C3/064 , C03C3/066 , C03C3/093 , G02F2001/133302
摘要： A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO2, Al2O3, and B2O3 satisfy a relationship (SiO2+Al2O3)/(B2O3)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×106.
摘要翻译： 平板显示器玻璃基板包括以摩尔％计含有55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3和3-25％RO（MgO，CaO，SrO， 和BaO）。 SiO 2，Al 2 O 3和B 2 O的摩尔％含量满足关系式（SiO2 + Al2O3）/（B2O3）= 7.5-17。 玻璃的应变点为665℃以上。 玻璃的失透温度为1250℃以下。 基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的基板的收缩量算出，该热处理以10℃/分钟和550℃的上升和下降温度进行2小时，以 热收缩率（ppm）= {热处理后的基板的收缩量/热处理前的基板的长度}×106。
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公开(公告)号：US08853113B2
公开(公告)日：2014-10-07
申请号：US13537579
申请日：2012-06-29
申请人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro Koyama , Satoshi Ami , Manabu Ichikawa
IPC分类号： C03C3/091 , C03C3/085 , C03C3/087 , G02F1/1333 , H01L51/00
CPC分类号： C03C3/091 , C03C3/093 , G02F2001/133302 , H01L51/0096
摘要： A flat panel display glass substrate according to the present invention includes a glass comprising, as expressed in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, 3-25% RO (the total amount of MgO, CaO, SrO, and BaO), and substantially no As2O3 and Sb2O3. The devitrification temperature of the glass is 1250° C. or less. The glass substrate has a heat shrinkage rate of 75 ppm or less. The heat shrinkage rate is calculated from the amount of shrinkage of the glass substrate measured after a heat treatment which is performed at a temperature rising and falling rate of 10° C./min and at 550° C. for 2 hours by the heat shrinkage rate (ppm)={the amount of shrinkage of the glass substrate after the heat treatment/the length of the glass substrate before the heat treatment}×106.
摘要翻译： 根据本发明的平板显示器玻璃基板包括玻璃，其以摩尔％表示，为55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3，3-25％RO（总量 MgO，CaO，SrO和BaO），并且基本上不含As2O3和Sb2O3。 玻璃的失透温度为1250℃以下。 玻璃基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的玻璃基板的收缩量，以10℃/分钟和550℃的升温和降温率通过热收缩率进行2小时计算 速率（ppm）= {热处理后的玻璃基板的收缩量/热处理前的玻璃基板的长度}×106。
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公开(公告)号：US20130065748A1
公开(公告)日：2013-03-14
申请号：US13537615
申请日：2012-06-29
申请人： Akihiro KOYAMA , Satoshi Ami , Manabu Ichikawa
发明人： Akihiro KOYAMA , Satoshi Ami , Manabu Ichikawa
CPC分类号： C03C3/091 , C03B17/00 , C03B17/06 , C03B17/064 , C03B25/00 , C03C3/064 , C03C3/066 , C03C3/093 , G02F2001/133302
摘要： A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO2, Al2O3, and B2O3 satisfy a relationship (SiO2+Al2O3)/(B2O3)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×106.
摘要翻译： 平板显示器玻璃基板包括以摩尔％计含有55-80％SiO 2，3-20％Al 2 O 3，3-15％B 2 O 3和3-25％RO（MgO，CaO，SrO， 和BaO）。 SiO 2，Al 2 O 3和B 2 O的摩尔％含量满足关系式（SiO2 + Al2O3）/（B2O3）= 7.5-17。 玻璃的应变点为665℃以上。 玻璃的失透温度为1250℃以下。 基板的热收缩率为75ppm以下。 热收缩率由热处理后测定的基板的收缩量算出，该热处理以10℃/分钟和550℃的上升和下降温度进行2小时，以 热收缩率（ppm）= {热处理后的基板的收缩量/热处理前的基板的长度}×106。
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公开(公告)号：US09434644B2
公开(公告)日：2016-09-06
申请号：US13247627
申请日：2011-09-28
IPC分类号： C03C3/085 , C03C3/091 , C03C3/093 , C03C21/00 , C03C3/087 , C03C15/00 , C03C3/083 , C03C15/02
摘要： The disclosed cover glass is produced by etching a glass substrate that has been formed by a down-drawing process, and chemically strengthening the glass substrate to provide the glass substrate with a compressive-stress layer on the principal surfaces thereof. The glass substrate contains, as components thereof, 50% to 70% by mass of SiO2, 5% to 20% by mass of Al2O3, 6% to 30% by mass of Na2O, and 0% to less than 8% by mass of Li2O. The glass substrate may also contain 0% to 2.6% by mass of CaO, if necessary. The glass substrate has an etching characteristic in which the etching rate is at least 3.7 μm/minute in an etching environment having a temperature of 22° C. and containing hydrogen fluoride with a concentration of 10% by mass.
摘要翻译： 所公开的盖玻璃通过蚀刻通过下拉法形成的玻璃基板，并化学强化玻璃基板，以在玻璃基板的主表面上提供压应力层来制造。 玻璃基板作为其成分含有50〜70质量％的SiO 2，5〜20质量％的Al 2 O 3，6〜30质量％的Na 2 O，0〜8质量％ Li2O。 如果需要，玻璃基板也可以含有0〜2.6质量％的CaO。 玻璃基板具有蚀刻特性，其中在温度为22℃的蚀刻环境中蚀刻速率至少为3.7μm/分钟，并且含有浓度为10质量％的氟化氢。
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公开(公告)号：US08840997B2
公开(公告)日：2014-09-23
申请号：US13338651
申请日：2011-12-28
申请人： Akihiro Koyama , Satoshi Ami , Kazuaki Hashimoto , Tetsuo Takano
发明人： Akihiro Koyama , Satoshi Ami , Kazuaki Hashimoto , Tetsuo Takano
CPC分类号： C03C3/085 , C03C21/002 , Y10T428/315
摘要： A cover glass having a compressive-stress layer on the principal surfaces thereof, and having a glass composition containing 50% to 70% by mole of SiO2, 3% to 20% by mole of Al2O3, 5% to 25% by mole of Na2O, more than 0% by mole and less than or equal to 2.5% by mole of Li2O, 0% to 5.5% by mole of K2O, and 0% to less than 3% by mole of B2O3. Also disclosed is a method for producing a cover glass which includes: (i) preparing molten glass by melting a glass raw material; (ii) forming the prepared molten glass into a plate-like shape by a down-draw process and thereby obtaining a glass substrate; and (iii) forming a compressive-stress layer on the surface of the glass substrate.
摘要翻译： 一种在其主表面上具有压应力层的玻璃玻璃，并且具有含有50〜70摩尔％的SiO 2，3〜20摩尔％的Al 2 O 3，5〜25摩尔％的Na 2 O的玻璃组合物 ，大于等于0摩尔％且小于或等于2.5摩尔％的Li 2 O，0〜5.5摩尔％的K 2 O和0〜3摩尔％以下的B 2 O 3。 还公开了一种盖玻璃的制造方法，其包括：（i）通过熔化玻璃原料来制备熔融玻璃; （ii）通过下拉法将所制备的熔融玻璃形成为板状，从而获得玻璃基板; 和（iii）在玻璃基板的表面上形成压应力层。
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