利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.021 秒)

    X-ray optical system
    2.
    发明申请
    X-ray optical system 有权
    X光光学系统

    公开(公告)号：US20080084967A1

    公开(公告)日：2008-04-10

    申请号：US11973825

    申请日：2007-10-10

    申请人： Ryuji Matsuo ,  Akira Echizenya ,  Go Fujinawa

    发明人： Ryuji Matsuo ,  Akira Echizenya ,  Go Fujinawa

    IPC分类号： G21K1/02

    CPC分类号： G21K1/06 ,  G21K1/025

    摘要： An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.

    摘要翻译： X射线光学系统选择性地提供线性X射线束和点X射线束，同时使用产生具有线性部分的X射线束的X射线源。 当选择点X射线束时，每单位面积的X射线强度变高。 X射线光学系统具有X射线源，安装孔径狭缝板的抛物面多层反射镜，光路选择狭缝器件，多毛细管光学器件和出口宽度限制狭缝。 多毛细管光学器件和出口宽度限制狭缝可拆卸地插入到来自抛物面多层反射镜的平行光束的路径中，因此它们可以从路径移除，并且可以插入索勒狭缝和发散狭缝。

    X-ray optical system
    3.
    发明授权
    X-ray optical system 有权
    X光光学系统

    公开(公告)号：US07542548B2

    公开(公告)日：2009-06-02

    申请号：US11973825

    申请日：2007-10-10

    申请人： Ryuji Matsuo ,  Akira Echizenya ,  Go Fujinawa

    发明人： Ryuji Matsuo ,  Akira Echizenya ,  Go Fujinawa

    IPC分类号： G21K1/06

    CPC分类号： G21K1/06 ,  G21K1/025

    摘要： An X-ray optical system provides selectively a linear X-ray beam and a point X-ray beam while using an X-ray source which generates an X-ray beam having a linear section. When the point X-ray beam is selected, an X-ray intensity per unit area becomes higher. The X-ray optical system has an X-ray source, a parabolic multilayer mirror to which an aperture slit plate is attached, an optical-path selection slit device, a polycapillary optics and an exit-width restriction slit. The polycapillary optics and the exit-width restriction slit are detachably inserted into a path of a parallel beam coming from the parabolic multilayer mirror, and thus they can be removed from the path and a Soller slit and a divergence slit can be inserted instead.

    摘要翻译： X射线光学系统选择性地提供线性X射线束和点X射线束，同时使用产生具有线性部分的X射线束的X射线源。 当选择点X射线束时，每单位面积的X射线强度变高。 X射线光学系统具有X射线源，安装孔径狭缝板的抛物面多层反射镜，光路选择狭缝器件，多毛细管光学器件和出口宽度限制狭缝。 多毛细管光学器件和出口宽度限制狭缝可拆卸地插入到来自抛物面多层反射镜的平行光束的路径中，因此它们可以从路径移除，并且可以插入索勒狭缝和发散狭缝。

    X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same
    4.
    发明授权
    X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same 有权
    其中具有德拜勒光学系统的X射线衍射测量装置及其X射线衍射测量方法

    公开(公告)号：US07860217B2

    公开(公告)日：2010-12-28

    申请号：US12238471

    申请日：2008-09-26

    申请人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Go Fujinawa ,  Akira Echizenya

    发明人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Go Fujinawa ,  Akira Echizenya

    IPC分类号： G01N23/207

    CPC分类号： G01N23/20

    摘要： An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a generator for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector being disposed to surround that sample around; and a focusing arrangement, being disposed between the sample and the X-ray detector, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and for focusing and irradiating it upon the X-ray detector.

    摘要翻译： 在其中配备有德拜舍勒光学系统的X射线衍射测量装置包括用于产生待照射待测样品的特征X射线的发生器; 设置为围绕该样本的X射线检测器; 以及配置在样品和X射线检测器之间的聚焦装置，用于在样品周围沿周向收集来自样品覆盖物的X射线散射预定角度，并且用于聚焦并将其照射在 X射线探测器。

    X-Ray Diffraction Measuring Apparatus Having Debye-Scherrer Optical System Therein, and an X-ray Diffraction Measuring Method for the Same
    5.
    发明申请
    X-Ray Diffraction Measuring Apparatus Having Debye-Scherrer Optical System Therein, and an X-ray Diffraction Measuring Method for the Same 有权
    其中具有德拜舍勒光学系统的X射线衍射测量装置及其相同的X射线衍射测量方法

    公开(公告)号：US20090086910A1

    公开(公告)日：2009-04-02

    申请号：US12238471

    申请日：2008-09-26

    申请人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Go Fujinawa ,  Akira Echizenya

    发明人： Tetsuya Ozawa ,  Ryuji Matsuo ,  Go Fujinawa ,  Akira Echizenya

    IPC分类号： G01N23/20

    CPC分类号： G01N23/20

    摘要： An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a means for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector means being disposed to surround that sample around; and a focusing means, being disposed between the sample and the X-ray detector means, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and thereby irradiating it upon the X-ray detector means.

    摘要翻译： 在其中配备有德拜 - 谢勒光学系统的X射线衍射测量装置包括用于产生待照射待测样品的特征X射线的装置; 被设置为围绕该样本的X射线检测器装置; 以及聚焦装置，设置在样品和X射线检测器装置之间，用于在样品周围沿周向收集来自样品覆盖物的X射线散射预定角度，从而将其照射在X上 射线检测装置。