公开(公告)号：US20240230324A9

公开(公告)日：2024-07-11

申请号：US18365375

申请日：2023-08-04

Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

Inventor： Fenglin ZHANG ,  Jianlin LIU ,  Shaoteng REN ,  Siyuan QI ,  Zhimeng SHI

IPC: G01B15/00 ,  G01B21/16

CPC classification number: G01B15/00 ,  G01B21/16 ,  H01M10/045

Abstract: A gap inspection apparatus and a gap inspection method are disclosed. The gap inspection apparatus is configured for a wound battery cell, where in a height direction of the wound battery cell. The gap inspection apparatus includes: an X-ray source and an X-ray detector and a bearing mechanism located between the X-ray source and the X-ray detector. The bearing mechanism includes at least one accommodating groove, the accommodating groove is configured to accommodate the wound battery cell, and the height direction of the wound battery cell crosses a first direction in which the X-ray source points to the X-ray detector. The X-ray source is configured to irradiate an arc-shaped area of the wound body portion, and the X-ray detector is configured to obtain an imaging image of the irradiated arc-shaped area, so as to obtain a gap value between two electrode plates within the arc-shaped area.

公开(公告)号：US20240183799A1

公开(公告)日：2024-06-06

申请号：US18551707

申请日：2022-03-14

Applicant: GSI Electronique Inc ,  University of Manitoba

Inventor： Mohammad Asefi ,  Max Aaron Kelner Hughson ,  Hannah Claire Fogel ,  Ian Jeffrey ,  Joe LoVetri ,  Colin Gerald Gilmore

IPC: G01N22/04 ,  G01B15/00 ,  G01F23/284 ,  G06T7/00

CPC classification number: G01N22/04 ,  G01B15/00 ,  G01F23/284 ,  G06T7/0002 ,  G06T2207/10088 ,  G06T2207/20084

Abstract: In one embodiment, an electromagnetic imaging method, comprising: determining electromagnetic resonance data based on interrogating a stored commodity; and estimating features of the stored commodity based on the electromagnetic resonance data.

公开(公告)号：US20240175678A1

公开(公告)日：2024-05-30

申请号：US18092349

申请日：2023-01-02

Applicant: May Patents Ltd.

Inventor： Yehuda BINDER

IPC: G01B11/26 ,  G01B11/02 ,  G01B15/00 ,  G01S13/87 ,  G01S15/08 ,  G01S15/42 ,  G01S17/08 ,  G01S13/46

CPC classification number: G01B11/26 ,  G01B11/026 ,  G01B15/00 ,  G01S13/878 ,  G01S15/08 ,  G01S15/42 ,  G01S17/08 ,  G01S2013/468

Abstract: A method and apparatus for an angle meter cooperatively using two or more non-contact distance meters for measuring distances to a surface along substantially parallel lines. The measured distances are used for estimating or calculating the angle to the surface and the distance to the surface. The distance meters may use optical means, where a visible or non-visible light or laser beam is emitted and received, acoustical means, where an audible or ultrasound sound is emitted and received, or an electro-magnetic scheme, where radar beam is transmitted and received. The distances may be estimated using a Time-of-Flight (TOF), homodyne or heterodyne phase detection schemes. The distance meters may share the same correlator, signal conditioning circuits, or the same sensor. Two or more angle meters may be used defining parallel or perpendicular measurement planes, for measuring angles between surfaces, and for estimating physical dimensions such as length, area or volume.

公开(公告)号：US11954848B2

公开(公告)日：2024-04-09

申请号：US17603658

申请日：2020-04-24

Applicant: TIAMA

Inventor： Olivier Colle ,  Benoit Cance ,  Laurent Cosneau ,  Laurent Desbat ,  Emanuel Maitre ,  Nicolas Szafran

IPC: G06T7/64 ,  G01B15/00 ,  G06T7/00 ,  G06T17/00 ,  H04N23/56 ,  H04N23/90

CPC classification number: G06T7/001 ,  G01B15/00 ,  G06T7/64 ,  G06T17/00 ,  H04N23/56 ,  H04N23/90 ,  G06T2200/08 ,  G06T2207/10028 ,  G06T2207/10116 ,  G06T2207/30108 ,  G06T2207/30241 ,  G06T2210/56

Abstract: The invention relates to a method and an installation for automatically measuring linear dimensions of manufactured objects (2) of a series comprising:



the disposition of at least one focal point (Fj) of X-rays, on a same base straight line parallel to the rectilinear trajectory of displacement of the objects and of one or several image sensors (Ci);
the acquisition, for each object during its displacement, of a set of one-dimensional images comprising, for a number (NK) of distinct section planes (Pk) containing the base straight line, a number (NP) of said images obtained along at least three different directions of projection (Dijk) in the section plane;
for each object, and for each distinct section plane (Pk), the determination, from the images obtained, of a delineation of the object in the considered section plane (Pk).

公开(公告)号：US11903755B2

公开(公告)日：2024-02-20

申请号：US16910088

申请日：2020-06-24

Applicant: Weng-Dah Ken ,  Fang-Chi Kan

Inventor： Weng-Dah Ken ,  Fang-Chi Kan

IPC: A61B6/00 ,  G01N37/00 ,  G01B9/02 ,  H01J37/244 ,  G01N23/20 ,  H01J37/26 ,  G01B15/00 ,  G04F5/14 ,  H01J37/04

CPC classification number: A61B6/4258 ,  A61B6/4035 ,  G01B9/02 ,  G01B15/00 ,  G01N23/20 ,  G01N37/005 ,  G04F5/14 ,  H01J37/04 ,  H01J37/244 ,  H01J37/26 ,  G01B2290/55 ,  H01J2237/06383 ,  H01J2237/24557 ,  H01J2237/24571 ,  H01J2237/24578 ,  H01J2237/24585 ,  H01J2237/2614

Abstract: A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.

公开(公告)号：US11698251B2

公开(公告)日：2023-07-11

申请号：US17137840

申请日：2020-12-30

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Nadav Gutman ,  Alexander Kuznetsov ,  Antonio Arion Gellineau

IPC: G01B15/00 ,  G03F7/00 ,  H01L21/66 ,  G01B15/02 ,  H01L21/027 ,  H10B10/00

CPC classification number: G01B15/00 ,  G01B15/02 ,  G03F7/70516 ,  G03F7/70633 ,  H01L22/12 ,  H01L22/20 ,  G01B2210/56 ,  H01L21/0276 ,  H10B10/12

Abstract: Methods and systems for performing overlay and edge placement errors based on Soft X-Ray (SXR) scatterometry measurement data are presented herein. Short wavelength SXR radiation focused over a small illumination spot size enables measurement of design rule targets or in-die active device structures. In some embodiments, SXR scatterometry measurements are performed with SXR radiation having energy in a range from 10 to 5,000 electronvolts. As a result, measurements at SXR wavelengths permit target design at process design rules that closely represents actual device overlay. In some embodiments, SXR scatterometry measurements of overlay and shape parameters are performed simultaneously from the same metrology target to enable accurate measurement of Edge Placement Errors. In another aspect, overlay of aperiodic device structures is estimated based on SXR measurements of design rule targets by calibrating the SXR measurements to reference measurements of the actual device target.

公开(公告)号：US11669953B2

公开(公告)日：2023-06-06

申请号：US15544643

申请日：2015-01-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Wataru Nagatomo ,  Yuichi Abe ,  Mitsuji Ikeda

IPC: G06T7/00 ,  G01B15/00 ,  G06T7/73 ,  G06T7/13 ,  G06K9/46 ,  H01J37/28 ,  G06K9/62 ,  G06V10/44 ,  G06V10/75 ,  G06T3/00 ,  H01J37/26

CPC classification number: G06T7/001 ,  G01B15/00 ,  G06T3/0068 ,  G06T7/13 ,  G06T7/74 ,  G06V10/44 ,  G06V10/751 ,  G06V10/752 ,  H01J37/261 ,  H01J37/28 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J2237/28 ,  H01J2237/2817

Abstract: The purpose of the present invention is to provide a pattern matching device and computer program that carry out highly accurate positioning even if edge positions and numbers change. The present invention proposes a computer program and a pattern matching device wherein a plurality of edges included in first pattern data to be matched and a plurality of edges included in second pattern data to be matched with the first pattern data are associated, a plurality of different association combinations are prepared, the plurality of association combinations are evaluated using index values for the plurality of edges, and matching processing is carried out using the association combinations selected through the evaluation.

公开(公告)号：US20190178640A1

公开(公告)日：2019-06-13

申请号：US16325590

申请日：2016-08-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Tomihiro HASHIZUME ,  Masatoshi YASUTAKE ,  Sanato NAGATA

IPC: G01B15/08 ,  G01N15/02 ,  G01N15/06 ,  G01N23/225 ,  G01Q30/06

CPC classification number: G01B15/08 ,  G01B15/00 ,  G01N15/02 ,  G01N15/06 ,  G01N23/225 ,  G01Q30/06

Abstract: To provide a sample for measuring particles enabling the three-dimensional particulate shape to be measured and the particulate species to be evaluated, the sample for measuring particles includes a substrate; isolated nanoparticles to be measured which are disposed on the substrate; and isolated standard nanoparticles which are disposed on the substrate in the vicinity of the isolated nanoparticles to be measured.

公开(公告)号：US10060946B2

公开(公告)日：2018-08-28

申请号：US15449419

申请日：2017-03-03

Applicant: The United States of America, as represented by the Secretary of Commerce

Inventor： Taylor J. Woehl ,  Ryan B. Wagner ,  Jason Killgore ,  Robert Keller

IPC: G01Q20/00 ,  G01B15/00 ,  G01N23/22

CPC classification number: G01Q20/00 ,  G01B15/00 ,  G01N23/22

Abstract: An electron vibrometer includes: an electron source providing a beam of primary electrons; a cantilever including: a receiver portion including: a gradient in thickness, a gradient in mass, atomic number of constituent atoms, or a combination thereof, the cantilever being disposed relative to the electron source such that the receiver portion of the cantilever receives the beam of primary electrons, and produces a plurality of scattered electrons from the receiver portion in response to receipt of the beam of primary electrons; and a charged particle detector that receives the plurality of scattered electrons from the receiver portion, and produces a detector signal comprising an amplitude that varies in relation to the gradient subject to receipt of the primary electrons, and the detector signal providing determination of the displacement of the cantilever.

公开(公告)号：US10060865B2

公开(公告)日：2018-08-28

申请号：US15065637

申请日：2016-03-09

Applicant: Lyncean Technologies, Inc.

Inventor： Ronald D. Ruth ,  Roderick J. Loewen ,  Martin A. Gifford

IPC: G01N23/207 ,  G01B15/00

CPC classification number: G01N23/207 ,  G01B15/00 ,  G01B2210/56 ,  G01N2223/6116

Abstract: The manufactured structure is illuminated with an x-ray beam. The manufactured structure is positioned at a selected grazing angle and a selected rotation angle with respect to the x-ray beam. The selected rotation angle has been selected to enhance in-plane diffraction of reflections of the x-ray beam by the manufactured structure. A grazing in-plane diffraction beam produced by interference with the periodic feature is detected. A property of the grazing in-plane diffraction beam is determined by the critical dimension.