利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

15 条记录 (耗时 0.037 秒)

    Wafer cleaning method and system
    7.
    发明授权
    Wafer cleaning method and system 失效
    晶圆清洗方法及系统

    公开(公告)号：US6070284A

    公开(公告)日：2000-06-06

    申请号：US113703

    申请日：1998-07-10

    申请人： Alejandro Garcia ,  Brent Krick ,  Anthony Nichtawitz ,  Daniel Nordeen ,  Josh Oen ,  Kenneth Smith ,  Vincent Suro ,  Daniel Wolf

    发明人： Alejandro Garcia ,  Brent Krick ,  Anthony Nichtawitz ,  Daniel Nordeen ,  Josh Oen ,  Kenneth Smith ,  Vincent Suro ,  Daniel Wolf

    IPC分类号： H01L21/00 ,  A47L1/02

    CPC分类号： H01L21/67057 ,  H01L21/67046

    摘要： A wafer cleaning apparatus provides two opposed brushes for brushing a vertically disposed wafer in a tank which can contain a process liquid. A pressure controller adaptively controls the pressure exerted by the brushes on the wafer to compensate for brush wear. Rim driving wheels engage the wafer periphery with a porous jacket coupled to a fluid delivery system, thereby simultaneously rotating and cleaning the periphery of the wafer. The apparatus includes a fluid delivery system for separately and independently delivering a plurality of constituents of a cleaning solution to the brushes, thereby ensuring that a freshly mixed cleaning solution reaches the wafer. The tank can be filled with a process liquid through which megasonic waves provided by a transducer can propagate and impinge upon the wafer thereby enhancing the cleaning of the wafer or the brushes.

    摘要翻译： 晶片清洁装置提供两个相对的刷子，用于刷洗可容纳处理液体的罐中的垂直设置的晶片。 压力控制器自适应地控制由电刷施加在晶片上的压力以补偿刷磨损。 轮缘驱动轮通过与流体输送系统连接的多孔套接合晶片周边，从而同时旋转和清洁晶片的周边。 该装置包括一个流体输送系统，用于将清洁溶液的多个组分分别独立地输送到刷子，从而确保新鲜混合的清洁溶液到达晶片。 罐可以填充处理液体，由换能器提供的超声波可以传播并撞击在晶片上，从而增强了晶片或刷子的清洁。

    COAL ENHANCEMENT PROCESS
    8.
    发明申请
    COAL ENHANCEMENT PROCESS 审中-公开
    煤炭加固工艺

    公开(公告)号：US20110094150A1

    公开(公告)日：2011-04-28

    申请号：US12736535

    申请日：2008-04-15

    申请人： Larry Hunt ,  Anton Dilo Paul ,  Florentino J. Mendez ,  Alejandro Garcia

    发明人： Larry Hunt ,  Anton Dilo Paul ,  Florentino J. Mendez ,  Alejandro Garcia

    IPC分类号： C10L5/44

    CPC分类号： C10L9/08 ,  C10L5/04 ,  C10L2290/06 ,  C10L2290/08 ,  C10L2290/10 ,  Y02E50/10 ,  Y02E50/30

    摘要： The present process produces a clean burning coal from low grade coal and has a higher heating value per unit mass, as compared to the feed stock coal. The clean coal may be used in coal-fired power plants, industrial boilers, and homes since it produces fewer or none of the emissions commonly associated with coal burning devices. The process treats coal prior to its combustion and removes about 90 percent of the pollutants. These pollutants are removed within 6 to 18 minutes, many of which may be recycled into products such as roofing tar, chemical feed stocks, and light hydrocarbons that can be used as gaseous fuels. The final product is suitable for use in homes where coal is used for cooking and heating, and significantly improves the health of those who have previously been exposed to toxic fumes from burning uncleaned coal in their homes. The process is fueled by its own by-products, recycles heat, and reduces coal weight to save energy in transporting it to the user.

    摘要翻译： 与原料煤相比，本方法从低等级煤产生清洁燃烧的煤，并且每单位质量具有更高的热值。 清洁煤可以用于燃煤发电厂，工业锅炉和家庭，因为它产生的燃煤装置通常相关的排放量较少或没有。 该过程在燃烧之前处理煤，并去除大约90％的污染物。 这些污染物在6至18分钟内被清除，其中许多可以再循环到诸如屋顶焦油，化学原料和可用作气态燃料的轻质烃类的产品中。 最终产品适用于煤炭用于烹饪和加热的家庭，并显着提高那些曾经遭受有毒烟雾的人员在家中燃烧未清洁煤炭的健康。 该过程由其自身的副产物加热，再循环热量，并减少煤的重量，以节省将能量输送给用户的能量。

    Wafer cleaning system
    9.
    发明授权
    Wafer cleaning system 失效
    晶圆清洗系统

    公开(公告)号：US06308369B1

    公开(公告)日：2001-10-30

    申请号：US09511775

    申请日：2000-02-24

    申请人： Alejandro Garcia ,  Brent Krick ,  Anthony Nichtawitz ,  Daniel Nordeen ,  Josh Oen ,  Kenneth Smith ,  Vincent Suro ,  Daniel Wolf

    发明人： Alejandro Garcia ,  Brent Krick ,  Anthony Nichtawitz ,  Daniel Nordeen ,  Josh Oen ,  Kenneth Smith ,  Vincent Suro ,  Daniel Wolf

    IPC分类号： B08B104

    CPC分类号： H01L21/67057 ,  H01L21/67046

    摘要： A wafer cleaning apparatus provides two opposed brushes for brushing a vertically disposed wafer in a tank which can contain a process liquid. A pressure controller adaptively controls the pressure exerted by the brushes on the wafer to compensate for brush wear. Rim driving wheels engage the wafer periphery with a porous jacket coupled to a fluid delivery system, thereby simultaneously rotating and cleaning the periphery of the wafer. The apparatus includes a fluid delivery system for separately and independently delivering a plurality of constituents of a cleaning solution to the brushes, thereby ensuring that a freshly mixed cleaning solution reaches the wafer. The tank can be filled with a process liquid through which megasonic waves provided by a transducer can propagate and impinge upon the wafer thereby enhancing the cleaning of the wafer or the brushes.

    摘要翻译： 晶片清洁装置提供两个相对的刷子，用于刷洗可容纳处理液体的罐中的垂直设置的晶片。 压力控制器自适应地控制由电刷施加在晶片上的压力以补偿刷磨损。 轮缘驱动轮通过与流体输送系统连接的多孔套接合晶片周边，从而同时旋转和清洁晶片的周边。 该装置包括一个流体输送系统，用于将清洁溶液的多个组分分别独立地输送到刷子，从而确保新鲜混合的清洁溶液到达晶片。 罐可以填充处理液体，由换能器提供的超声波可以传播并撞击在晶片上，从而增强了晶片或刷子的清洁。

    Method of producing yarns and fabrics
    10.
    发明申请
    Method of producing yarns and fabrics 审中-公开
    生产纱线和织物的方法

    公开(公告)号：US20060014016A1

    公开(公告)日：2006-01-19

    申请号：US11066044

    申请日：2005-02-25

    申请人： Gilberto Lardizabal ,  Filemon Pelaez ,  Hermilo Perez ,  Francisco Sanchez ,  Miguel Hernandez ,  Gerardo Chavez ,  Rafael Talavera ,  Armando Perez ,  Alejandro Garcia ,  Angel Mejia ,  Antonio Torres ,  Johnny Hughes

    发明人： Gilberto Lardizabal ,  Filemon Pelaez ,  Hermilo Perez ,  Francisco Sanchez ,  Miguel Hernandez ,  Gerardo Chavez ,  Rafael Talavera ,  Armando Perez ,  Alejandro Garcia ,  Angel Mejia ,  Antonio Torres ,  Johnny Hughes

    IPC分类号： D02G3/00

    CPC分类号： D02G3/402 ,  Y10T428/2933

    摘要： The yarns of the present invention satisfy the need for a multi-purpose yarn, capable of improved abrasion resistance, seam slippage and dimensional stability while eliminating traditional fabric's backing materials and costs associated with the production thereof. In one aspect, the method of producing yarn and fabrics comprises supplying a first yarn, supplying a low melt yarn, placing the two yarns adjacent to one another, and winding the two adjacent yarns. In another aspect, the method of producing yarns and fabrics further comprises weaving the yarns into a fabric and heating the fabric, wherein heating the fabric heats the low melt yarn, melting at least one filament and adhering the low melt yarn to the first yarn or fabric. In yet another aspect, the method of producing yarns and fabrics further comprises weaving the yarns into a fabric, breaking at least one filament of the low melt yarn, and heating the low melt yarn, wherein heating the low melt yarn melts at least one broken filament thereby adhering the low melt yarn to the first yarn or fabric.

    摘要翻译： 本发明的纱线满足了对多用途纱线的需要，该多用途纱线能够在消除传统织物的背衬材料和与其生产相关的成本的同时，改善耐磨性，接缝滑动和尺寸稳定性。 一方面，纱线和织物的制造方法包括：供给第一纱线，供给低熔点纱线，将两根纱线彼此相邻放置，卷绕两根相邻纱线。 另一方面，生产纱线和织物的方法还包括将纱线编织成织物并加热织物，其中加热织物加热低熔点纱线，熔化至少一根细丝并将低熔点纱线粘附到第一纱线上，或 布。 另一方面，生产纱线和织物的方法还包括将纱线编织成织物，破坏低熔点纱线的至少一根细丝并加热低熔点纱线，其中加热低熔点纱线至少熔化一个破碎的 从而将低熔点纱线粘附到第一纱线或织物上。