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    Imprint lithography
    1.
    发明申请
    Imprint lithography 审中-公开
    印刷光刻

    公开(公告)号：US20060144274A1

    公开(公告)日：2006-07-06

    申请号：US11025600

    申请日：2004-12-30

    申请人： Aleksey Kolesnychenko ,  Helmar Santen ,  Yvonne Kruijt-Stegeman ,  Erik Loopstra

    发明人： Aleksey Kolesnychenko ,  Helmar Santen ,  Yvonne Kruijt-Stegeman ,  Erik Loopstra

    IPC分类号： B41F33/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprinting method is disclosed, in which an embodiment involves subjecting an imprintable medium on a substrate to conditions such that the medium is at a first temperature so that it is in a flowable state, the imprintable medium comprising an imprint material selected from a group consisting of: a crystalline material and a polycrystalline material, pressing a template into the medium to form an imprint in the medium, cooling the medium to a second temperature such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while in the substantially non-flowable state.

    摘要翻译： 公开了一种压印方法，其中一个实施例涉及使基材上的可压印介质经受使得介质处于第一温度使其处于可流动状态的状态，所述可压印介质包括压印材料，所述压印材料选自 的结晶材料和多晶材料，将模板压入介质以在介质中形成印迹，将介质冷却至第二温度，使得介质处于基本上不可流动状态，同时介质与 模板，并且在基本上不可流动的状态下将模板与介质分离。

    Imprint lithography
    3.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20060266244A1

    公开(公告)日：2006-11-30

    申请号：US11139991

    申请日：2005-05-31

    申请人： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

    发明人： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

    IPC分类号： B41F1/34

    CPC分类号： B41F1/34 ,  B41F1/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7084 ,  H05K1/0269 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0108

    摘要： An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

    摘要翻译： 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。

    Imprint lithography
    9.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20060196377A1

    公开(公告)日：2006-09-07

    申请号：US11072686

    申请日：2005-03-07

    申请人： Erik Loopstra ,  Aleksey Kolesnychenko ,  Helmar Santen

    发明人： Erik Loopstra ,  Aleksey Kolesnychenko ,  Helmar Santen

    IPC分类号： B41F33/00

    CPC分类号： G03F7/0002 ,  B41M3/003 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.

    摘要翻译： 公开了一种压印方法，其包括在一个实施例中，将可流动状态的可压印介质的体积重新分布在衬底的表面的目标部分上的不同体积的区域对应于不同图案密度的区域 模板，在可流动状态下与模板接触以在培养基中形成压印图案，使培养基经受条件以将培养基改变为基本上不可流动的状态，并将模板与培养基分离，同时基本上 不可流动状态。