公开(公告)号：US20090207399A1

公开(公告)日：2009-08-20

申请号：US12318035

申请日：2008-12-19

申请人： Alex F. Fong ,  Henricus Wilhelmus Maria Van Buel ,  Joseph J. Consolini ,  Michael Josephus Evert Van De Moosdijk ,  Michael Charles Robles

发明人： Alex F. Fong ,  Henricus Wilhelmus Maria Van Buel ,  Joseph J. Consolini ,  Michael Josephus Evert Van De Moosdijk ,  Michael Charles Robles

IPC分类号： G03B27/58 ,  G01B11/00

CPC分类号： G03F9/7011 ,  B01J21/04 ,  G03F9/7019 ,  G03F9/7084 ,  G03F9/7088

摘要： A method of calibrating a front to backside alignment capable lithographic apparatus. The method includes attaching a substrate having a plurality of alignment marks to a carrier, the substrate being arranged such that the alignment marks face towards the carrier; reducing the thickness of the substrate; using an alignment system of the apparatus to measure the positions of images of alignment marks formed by optics in a substrate table of the apparatus; projecting a pattern onto the substrate, the position of the pattern being determined according to the measured positions of the alignment marks; measuring the positions of the projected pattern and the alignment marks provided on the opposite side of the substrate, the position of the alignment marks provided on the opposite side of the substrate being measured by the alignment system directing radiation through the substrate; and comparing the measured positions in order to determine an overlay error.

摘要翻译： 校准从前到后对准的光刻设备的方法。 所述方法包括将具有多个对准标记的基板附接到载体上，所述基板布置成使得所述对准标记朝向所述载体; 减小基板的厚度; 使用所述装置的对准系统来测量由所述装置的衬底台中的光学元件形成的对准标记的图像的位置; 将图案投影到基板上，根据对准标记的测量位置确定图案的位置; 测量投影图案的位置和设置在基板的相对侧上的对准标记，设置在基板的相对侧上的对准标记的位置由通过基板引导辐射的对准系统测量; 并比较测量位置以确定重叠误差。

公开(公告)号：US07408624B2

公开(公告)日：2008-08-05

申请号：US11170735

申请日：2005-06-30

申请人： Michael Josephus Evert Van De Moosdijk ,  Klaus Simon ,  Wilhelmus Johannes Maria De Laat

发明人： Michael Josephus Evert Van De Moosdijk ,  Klaus Simon ,  Wilhelmus Johannes Maria De Laat

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70691

摘要： A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.

摘要翻译： 光刻设备包括：衬底台，其构造成保持第一类型的第一衬底，所述第一衬底具有抛光表面; 以及投影系统，被配置为将图案化的辐射束投影到基板的目标部分上。 抛光表面支撑第二类型的第二衬底，并且投影系统被配置为将图案化的辐射束投影到第二衬底上。