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公开(公告)号:US08920764B2
公开(公告)日:2014-12-30
申请号:US13370076
申请日:2012-02-09
申请人: Alexander Star , Narasimha Harindra Vedala , Gregg Peter Kotchey
发明人: Alexander Star , Narasimha Harindra Vedala , Gregg Peter Kotchey
IPC分类号: C01B31/04 , C09C1/56 , G01N27/12 , B82Y30/00 , B82Y40/00 , C12P3/00
CPC分类号: G01N27/4146 , B82Y30/00 , B82Y40/00 , C01B32/192 , C01B32/194 , C12P3/00 , G01N27/127 , G01N27/4145 , G01N33/5438 , G01N33/56916 , G01N2333/245 , Y10S977/734 , Y10S977/898
摘要: A method of forming a composition includes oxidation of graphene oxide to form holey graphene oxide having defects therein and reduction of the holey graphene oxide.
摘要翻译: 形成组合物的方法包括氧化石墨烯氧化物以形成其中具有缺陷的多孔石墨烯氧化物,并减少多孔石墨烯氧化物。