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12 条记录 (耗时 0.019 秒)

    Optical element, projection lens and associated projection exposure apparatus
    1.
    发明授权
    Optical element, projection lens and associated projection exposure apparatus 有权
    光学元件，投影透镜及相关投影曝光装置

    公开(公告)号：US07738187B2

    公开(公告)日：2010-06-15

    申请号：US12134062

    申请日：2008-06-05

    申请人： Alexandra Pazidis ,  Stephan Six ,  Ruediger Duesing ,  Gennady Fedosenko

    发明人： Alexandra Pazidis ,  Stephan Six ,  Ruediger Duesing ,  Gennady Fedosenko

    IPC分类号： G02B13/14

    CPC分类号： G02B21/33 ,  G03F7/70341 ,  G03F7/70958

    摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.

    摘要翻译： 一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。 另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为 超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。 光学元件可以以其至少部分地浸入有机液体的布置来设置。

    OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE APPARATUS
    2.
    发明申请
    OPTICAL ELEMENT, PROJECTION LENS AND ASSOCIATED PROJECTION EXPOSURE APPARATUS 有权
    光学元件，投影镜头及相关投影曝光装置

    公开(公告)号：US20080304035A1

    公开(公告)日：2008-12-11

    申请号：US12134062

    申请日：2008-06-05

    申请人： Alexandra Pazidis ,  Stephan Six ,  Ruediger Duesing ,  Gennady Fedosenko

    发明人： Alexandra Pazidis ,  Stephan Six ,  Ruediger Duesing ,  Gennady Fedosenko

    IPC分类号： G03B27/54 ,  G02B3/00

    CPC分类号： G02B21/33 ,  G03F7/70341 ,  G03F7/70958

    摘要： An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.

    摘要翻译： 一种光学元件（1），其由对UV区域中的波长透明的材料制成，该光学元件（1）包括其光学自由直径外的疏油涂层（6,7），其表面能的分散分量优选为 25mN / m以下，特别优选为20mN / m以下，特别优选为15mN / m以下。 另外或作为替代，光学元件（1）在其光学自由直径内包括对UV区域中的波长透明的亲油涂层（9b，9c），该涂层的表面能的分散组分优选为 超过25mN / m，特别优选大于30mN / m，特别是大于40mN / m。 光学元件可以以其至少部分地浸入有机液体的布置来设置。

    Optical imaging with reduced immersion liquid evaporation effects
    7.
    发明授权
    Optical imaging with reduced immersion liquid evaporation effects 有权
    光学成像与浸没液体蒸发效果降低

    公开(公告)号：US08934079B2

    公开(公告)日：2015-01-13

    申请号：US13285729

    申请日：2011-10-31

    申请人： Stephan Six

    发明人： Stephan Six

    IPC分类号： G03F7/20

    CPC分类号： G02B1/18 ,  G02B27/0006 ,  G03F7/7015 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70883

    摘要： An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.

    摘要翻译： 用于光学成像处理的光学装置包括光学元件，浸没区域和液体排斥装置。 在光学成像过程中，浸没区域位于光学元件附近，并且填充有浸没液体。 光学元件具有第一表面区域和第二表面区域。 在光学成像过程中，第一表面区域被浸渍液体润湿。 至少在光学成像过程中暂时，液体排斥装置在第二表面的区域中产生电场。 电场适于在对电场响应的浸没液体的部分上产生排斥力，并且不经意地接触第二表面区域。 排斥力具有从第二表面区域驱除浸没液体的部分的方向。

    METHOD FOR OPERATING A CONVERTER
    8.
    发明申请
    METHOD FOR OPERATING A CONVERTER 有权
    操作转换器的方法

    公开(公告)号：US20100084795A1

    公开(公告)日：2010-04-08

    申请号：US12443733

    申请日：2007-10-02

    申请人： Christian Imiela ,  Stephan Schulze ,  Stephan Six ,  Christoph Sundermann ,  Joerg Hertel ,  Rolf Best

    发明人： Christian Imiela ,  Stephan Schulze ,  Stephan Six ,  Christoph Sundermann ,  Joerg Hertel ,  Rolf Best

    IPC分类号： C21C5/50

    CPC分类号： C21C5/50

    摘要： In a method for operating a converter (1), in which the converter (1) is mounted in a carrying ring (3) by means of carrying journals (2), a gear mechanism (4) is mounted in a floating manner on the carrying journals (2), the converter (1) is configured, as a result, such that it can tilt about its horizontal axis and the gear mechanism (4) is connected rigidly to a pedestal (6) by a torque support (5), the torque support (5) connects the gear mechanism (4) to the pedestal (6) during the tilting operation of the converter (1), and the torque support (5) is released from the pedestal (6) or from the gear mechanism (4) or from both during operation of the converter (1).

    摘要翻译： 在用于操作转换器（1）的方法中，其中转换器（1）通过承载轴颈（2）安装在承载环（3）中，齿轮机构（4）以漂浮的方式安装在 （2），转换器（1）的结构使得其能够围绕其水平轴线倾斜，并且齿轮机构（4）通过扭矩支撑件（5）刚性地连接到基座（6） 在转换器（1）的倾转操作期间，扭矩支撑件（5）将齿轮机构（4）连接到基座（6），并且扭矩支撑件（5）从基座（6）或齿轮 机构（4）或两者在转换器（1）的操作期间。

    Wafer chuck for EUV lithography
    9.
    发明授权
    Wafer chuck for EUV lithography 有权
    用于EUV光刻的晶圆卡盘

    公开(公告)号：US08564925B2

    公开(公告)日：2013-10-22

    申请号：US13163100

    申请日：2011-06-17

    申请人： Stephan Six

    发明人： Stephan Six

    IPC分类号： H02N13/00

    CPC分类号： G03F7/70783 ,  G03F7/70708

    摘要： A wafer chuck (1b) having a substrate (2) and having, applied to the substrate (2), an electrically conductive coating (8) for fixing a wafer (6) by electrostatic attraction and preferably having a reflective coating (10) applied to the substrate (2). The coating (8; 10) has at least a first layer (3; 11) under compressive stress and at least a second layer (7; 12) under tensile stress for compensating for the compressive stress of the first layer (3; 11) in order to keep deformation of the wafer chuck (1b) by the coating (8, 10) as low as possible.

    摘要翻译： 一种具有衬底（2）并且具有施加到衬底（2）上的用于通过静电吸引固定晶片（6）的导电涂层（8）并且优选地具有应用反射涂层（10）的晶片卡盘（1b） （2）。 涂层（8; 10）在拉伸应力下至少具有压缩应力下的第一层（3; 11）和至少第二层（7; 12），用于补偿第一层（3; 11）的压缩应力， 以便通过涂层（8,10）保持晶片卡盘（1b）的变形尽可能低。

    OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS
    10.
    发明申请
    OPTICAL IMAGING WITH REDUCED IMMERSION LIQUID EVAPORATION EFFECTS 有权
    光学成像与降低液体蒸发效应

    公开(公告)号：US20120062865A1

    公开(公告)日：2012-03-15

    申请号：US13285729

    申请日：2011-10-31

    申请人： Stephan Six

    发明人： Stephan Six

    IPC分类号： G03B27/54 ,  G02B27/00

    CPC分类号： G02B1/18 ,  G02B27/0006 ,  G03F7/7015 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70883

    摘要： An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.

    摘要翻译： 用于光学成像处理的光学装置包括光学元件，浸没区域和液体排斥装置。 在光学成像过程中，浸没区域位于光学元件附近，并且填充有浸没液体。 光学元件具有第一表面区域和第二表面区域。 在光学成像过程中，第一表面区域被浸渍液体润湿。 至少在光学成像过程中暂时，液体排斥装置在第二表面的区域中产生电场。 电场适于在对电场响应的浸没液体的部分上产生排斥力，并且不经意地接触第二表面区域。 排斥力具有从第二表面区域驱除浸没液体的部分的方向。