Process for oxidation of methane to acetic acid
    6.
    发明申请
    Process for oxidation of methane to acetic acid 审中-公开
    将甲烷氧化成乙酸的方法

    公开(公告)号:US20070078280A1

    公开(公告)日:2007-04-05

    申请号:US11242716

    申请日:2005-10-03

    IPC分类号: C07C51/16

    摘要: Acetic acid or derivatives such as methyl acetate and acetyl sulfate, are produced from methane by contacting a methane-containing feed with an oxygen-containing gas in the presence of a palladium-containing catalyst and an acid selected from concentrated sulfuric acid and fuming sulfuric acid. The process is carried out using an oxygen partial pressure of from about 30 to about 300 psi and most preferably from about 60 to about 200 psi, a methane partial pressure of from about 100 to about 1000 psi, and most preferably from about 100 to about 400 psi, and a total pressure of oxygen and methane of from about 130 to about 1300 psi, preferably from about 200 to about 600 psi. The process is carried out in the absence of a catalyst promoter.

    摘要翻译: 在含钯催化剂和选自浓硫酸和发烟硫酸的酸的存在下,使含甲烷的进料与含氧气体接触,由甲烷生产乙酸或乙酸硫酸乙酯等衍生物 。 该方法使用约30至约300psi,最优选约60至约200psi的氧分压,约100至约1000psi的甲烷分压,最优选约100至约100psi 400psi,氧气和甲烷的总压力为约130至约1300psi,优选约200至约600psi。 该方法在不存在催化剂促进剂的情况下进行。

    METHODS AND ARRANGEMENT FOR DETECTING A WAFER-RELEASED EVENT WITHIN A PLASMA PROCESSING CHAMBER
    7.
    发明申请
    METHODS AND ARRANGEMENT FOR DETECTING A WAFER-RELEASED EVENT WITHIN A PLASMA PROCESSING CHAMBER 审中-公开
    用于检测等离子体处理室中的散发事件的方法和装置

    公开(公告)号:US20110060442A1

    公开(公告)日:2011-03-10

    申请号:US12557381

    申请日:2009-09-10

    IPC分类号: G06F19/00

    摘要: A method for identifying an optimal time for mechanically removing a substrate from a lower electrode in a processing chamber of a plasma processing system is provided. The method includes employing a set of sensors to monitor a set of electrical characteristics of a plasma, wherein the plasma is formed over the substrate during a dechuck event. The method also includes sending processing data about the set of electrical characteristics to a data collection device. The method further includes comparing the processing data against a set of threshold values. The method yet also includes, if the processing data traverses the threshold values, removing the substrate from the lower electrode since a substrate-released event has occurred.

    摘要翻译: 提供了一种用于识别在等离子体处理系统的处理室中从下电极机械地去除衬底的最佳时间的方法。 该方法包括采用一组传感器来监测等离子体的一组电特性,其中在脱帽事件期间在衬底上形成等离子体。 该方法还包括将关于一组电特性的处理数据发送到数据收集装置。 该方法还包括将处理数据与一组阈值进行比较。 该方法还包括,如果处理数据穿过阈值,则由于发生了衬底释放事件而从底部电极去除衬底。