专利检索 ap:("Align Technology, Inc.") AND inv:"Gyorgy Harakaly" 第 1 页

1.

发明授权
Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom 有权

公开(公告)号：US12042353B2

公开(公告)日：2024-07-23

申请号：US17883390

申请日：2022-08-08

申请人： Align Technology, Inc.

发明人： Robert Liska , Christian Gorsche , Gyorgy Harakaly , Markus Kury , Jurgen Stampfl , Peter Dorfinger , Yan Chen , Chunhua Li , Srinivas Kaza

IPC分类号： A61C7/08 , A61C7/10 , B22F10/12 , B22F10/20 , B22F10/38 , B22F10/60 , C08G18/10 , C08G18/32 , C08G18/34 , C08G18/44 , C08G18/73 , C08G18/75 , C08G18/81 , C08J5/00

CPC分类号： A61C7/08 , A61C7/10 , B22F10/12 , C08G18/10 , C08G18/3206 , C08G18/3212 , C08G18/348 , C08G18/44 , C08G18/73 , C08G18/755 , C08G18/815 , C08J5/00 , B22F10/20 , B22F10/38 , B22F10/60 , C08J2375/04

摘要： Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.