MOSFET SWITCH CIRCUIT FOR SLOW SWITCHING APPLICATION
    1.
    发明申请
    MOSFET SWITCH CIRCUIT FOR SLOW SWITCHING APPLICATION 审中-公开
    用于快速开关应用的MOSFET开关电路

    公开(公告)号:US20150295495A1

    公开(公告)日:2015-10-15

    申请号:US14252568

    申请日:2014-04-14

    IPC分类号: H02M3/158

    CPC分类号: H02M3/158 H03K17/164

    摘要: A switch circuit includes a first MOS transistor and a second MOS transistor of a same conductivity type connected in parallel between a first terminal and a second terminal. The first and second MOS transistors have respective gate terminals coupled to the control terminal to receive a control signal to turn the switch circuit on or off where the control signal transitions from a first voltage level to a second voltage level at a slow rate of change. The first MOS transistor has a first threshold voltage and the second MOS transistor has a second threshold voltage where the first threshold voltage is less than the second threshold voltage

    摘要翻译: 开关电路包括在第一端子和第二端子之间并联连接的相同导电类型的第一MOS晶体管和第二MOS晶体管。 第一和第二MOS晶体管具有耦合到控制端子的相应的栅极端子,以接收控制信号以使开关电路接通或关断,其中控制信号以缓慢的变化速率从第一电压电平转换到第二电压电平。 第一MOS晶体管具有第一阈值电压,而第二MOS晶体管具有第二阈值电压,其中第一阈值电压小于第二阈值电压

    MOSFET switch circuit for slow switching application

    公开(公告)号:US10418899B2

    公开(公告)日:2019-09-17

    申请号:US14252568

    申请日:2014-04-14

    IPC分类号: H02M3/158 H03K17/16

    摘要: A switch circuit includes a first MOS transistor and a second MOS transistor of a same conductivity type connected in parallel between a first terminal and a second terminal. The first and second MOS transistors have respective gate terminals coupled to the control terminal to receive a control signal to turn the switch circuit on or off where the control signal transitions from a first voltage level to a second voltage level at a slow rate of change. The first MOS transistor has a first threshold voltage and the second MOS transistor has a second threshold voltage where the first threshold voltage is less than the second threshold voltage.

    DEVICE STRUCTURE AND MANUFACTURING METHOD USING HDP DEPOSITED SOURCE-BODY IMPLANT BLOCK
    3.
    发明申请
    DEVICE STRUCTURE AND MANUFACTURING METHOD USING HDP DEPOSITED SOURCE-BODY IMPLANT BLOCK 审中-公开
    使用HDP沉积源体植入块的装置结构和制造方法

    公开(公告)号:US20160322469A1

    公开(公告)日:2016-11-03

    申请号:US14702695

    申请日:2015-05-02

    摘要: This invention discloses a semiconductor power device. The trenched semiconductor power device includes a trenched gate, opened from a top surface of a semiconductor substrate, surrounded by a source region encompassed in a body region near the top surface above a drain region disposed on a bottom surface of a substrate. The semiconductor power device further includes an implanting-ion block disposed above the top surface on a mesa area next to the body region having a thickness substantially larger than 0.3 micron for blocking body implanting ions and source ions from entering into the substrate under the mesa area whereby masks for manufacturing the semiconductor power device can be reduced.

    摘要翻译: 本发明公开了一种半导体功率器件。 沟槽半导体功率器件包括从半导体衬底的顶表面开口的沟槽栅极,被包围在设置在衬底底表面上的漏区以上的顶表面附近的体区中的源极区围绕。 所述半导体功率器件还包括植入离子块,所述植入离子块设置在所述身体区域旁边的台面区域的上表面上,所述植入离子块具有基本上大于0.3微米的厚度,用于阻挡体注入离子和源离子进入台面区域 从而可以减少用于制造半导体功率器件的掩模。