公开(公告)号：US07172788B2

公开(公告)日：2007-02-06

申请号：US10491764

申请日：2002-10-02

申请人： Andrey E. Yakshin ,  Eric Louis ,  Frederik Bijkerk ,  Marco Wedowski ,  Roman Klein ,  Frank Stietz

发明人： Andrey E. Yakshin ,  Eric Louis ,  Frederik Bijkerk ,  Marco Wedowski ,  Roman Klein ,  Frank Stietz

IPC分类号： B05D5/06 ,  G03F9/00 ,  B32B7/02

CPC分类号： B82Y10/00 ,  G02B5/08 ,  G02B5/0816 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067 ,  Y10T428/24942 ,  Y10T428/2495

摘要： In order to reduce contamination of optical elements which comprise a multilayer system on a substrate, it is proposed that the layer material and/or the layer thickness of at least one layer of the multilayer system are/is selected such that the standing wave which forms during reflection of the irradiated operating wavelength, forms a node of the electrical field intensity (node condition) in the area of the free interface of the multilayer system. Furthermore, a method for determining a design of a multilayer system, as well as a manufacturing process and a lithography apparatus are described.

摘要翻译： 为了减少在基板上包含多层体系的光学元件的污染，提出了选择多层体系的至少一层的层材料和/或层厚度，使得形成的驻波 在照射的工作波长的反射期间，在多层系统的自由界面的区域中形成电场强度（节点条件）的节点。 此外，还描述了一种用于确定多层系统的设计的方法，以及制造工艺和光刻设备。

公开(公告)号：US20060192158A1

公开(公告)日：2006-08-31

申请号：US11375267

申请日：2006-03-14

申请人： Marco Wedowski ,  Frank Stietz ,  Bas Mertens ,  Roman Klein

发明人： Marco Wedowski ,  Frank Stietz ,  Bas Mertens ,  Roman Klein

IPC分类号： G01J3/10

CPC分类号： G03F7/70925 ,  B08B7/0035 ,  G03F7/70916

摘要： The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.

摘要翻译： 本发明涉及一种防止在包括多层系统的光学元件的表面上的污染的方法，该方法在其包括残留气体气氛的抽真空封闭系统中以信号波长的辐射曝光期间，由此产生的光电流通过 测量来自多层系统的辐射表面的光发射。 光电流用于调节残留气体的气体成分。 气体组成根据光电流的至少一个下限和上限阈值而改变。 本发明还涉及一种用于在曝光期间调节至少一个光学元件的表面上的污染的装置以及用于清洁被碳污染的光学元件的表面的EUV-光刻设备和方法。

公开(公告)号：US20050104015A1

公开(公告)日：2005-05-19

申请号：US10506555

申请日：2003-03-07

申请人： Marco Wedowski ,  Frank Stietz ,  Bas Mertens ,  Roman Klein

发明人： Marco Wedowski ,  Frank Stietz ,  Bas Mertens ,  Roman Klein

IPC分类号： G21K1/06 ,  B08B7/00 ,  G03F7/20 ,  G21K5/00 ,  H01L21/027 ,  G01J1/00

CPC分类号： G03F7/70925 ,  B08B7/0035 ,  G03F7/70916

摘要： The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.

摘要翻译： 本发明涉及一种防止在包括多层系统的光学元件的表面上的污染的方法，该方法在其包括残留气体气氛的抽真空封闭系统中以信号波长的辐射曝光期间，由此产生的光电流通过 测量来自多层系统的辐射表面的光发射。 光电流用于调节残留气体的气体成分。 气体组成根据光电流的至少一个下限和上限阈值而改变。 本发明还涉及一种用于在曝光期间调节至少一个光学元件的表面上的污染的装置以及用于清洁被碳污染的光学元件的表面的EUV-光刻设备和方法。

公开(公告)号：US07462842B2

公开(公告)日：2008-12-09

申请号：US11375267

申请日：2006-03-14

申请人： Marco E. Wedowski ,  Frank Stietz ,  Bas M. Mertens ,  Roman Klein

发明人： Marco E. Wedowski ,  Frank Stietz ,  Bas M. Mertens ,  Roman Klein

IPC分类号： G03F7/20 ,  B08B7/00 ,  G01N23/227

CPC分类号： G03F7/70925 ,  B08B7/0035 ,  G03F7/70916

摘要： The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.

摘要翻译： 本发明涉及一种防止在包括多层系统的光学元件的表面上的污染的方法，该方法在其包括残留气体气氛的抽真空封闭系统中以信号波长的辐射曝光期间，由此产生的光电流通过 测量来自多层系统的辐射表面的光发射。 光电流用于调节残留气体的气体成分。 气体组成根据光电流的至少一个下限和上限阈值而改变。 本发明还涉及一种用于在曝光期间调节至少一个光学元件的表面上的污染的装置以及用于清洁被碳污染的光学元件的表面的EUV-光刻设备和方法。

公开(公告)号：US07060993B2

公开(公告)日：2006-06-13

申请号：US10506555

申请日：2003-03-07

申请人： Marco E. Wedowski ,  Frank Stietz ,  Bas M. Mertens ,  Roman Klein

发明人： Marco E. Wedowski ,  Frank Stietz ,  Bas M. Mertens ,  Roman Klein

IPC分类号： G03F7/20 ,  B08B7/00 ,  G01N23/227

CPC分类号： G03F7/70925 ,  B08B7/0035 ,  G03F7/70916

摘要： The invention relates to a method for preventing contamination on the surfaces of optical elements comprising a multi-layer system, during the exposure thereof to radiation at signal wave lengths in an evacuated closed system comprising a residual gas atmosphere, whereby the photocurrent generated by means of photo emission from the radiated surface of the multi-layer system is measured. The photocurrent is used to regulate the gas composition of the residual gas. The gas composition is altered according to at least one lower and one upper threshold value of the photocurrent. The invention also relates to a device for regulating the contamination on the surface of at least one optical element during exposure and an EUV-lithographic device and a method for cleaning the surfaces of the optical elements contaminated by carbon.

摘要翻译： 本发明涉及一种防止在包括多层系统的光学元件的表面上的污染的方法，该方法在其包括残留气体气氛的抽真空封闭系统中以信号波长的辐射曝光期间，由此产生的光电流通过 测量来自多层系统的辐射表面的光发射。 光电流用于调节残留气体的气体成分。 气体组成根据光电流的至少一个下限和上限阈值而改变。 本发明还涉及一种用于在曝光期间调节至少一个光学元件的表面上的污染的装置以及用于清洁被碳污染的光学元件的表面的EUV-光刻设备和方法。