Apparatus and method for in-situ endpoint detection for semiconductor processing operations
    1.
    发明授权
    Apparatus and method for in-situ endpoint detection for semiconductor processing operations 有权
    用于半导体处理操作的原位端点检测的装置和方法

    公开(公告)号:US08795029B2

    公开(公告)日:2014-08-05

    申请号:US13745691

    申请日:2013-01-18

    Abstract: An endpoint detection method includes processing an outer surface of a substrate, directing an incident light beam through a window in an opaque metal body onto the surface being processed, receiving at a detector a reflected light beam from the substrate and generating a signal from the detector, and generating a signal based on the reflected light beam received at the detector, and detecting a processing endpoint. The signal is a time-varying cyclic signal that varies as the thickness of the layer varies over time, and detecting the processing endpoint includes detecting that a portion of a cycle of the cyclic signal has passed, the portion being less than a full cycle of the cyclic signal.

    Abstract translation: 端点检测方法包括处理衬底的外表面,将入射光束通过不透明金属体中的窗口引导到被处理的表面上,在检测器处接收来自衬底的反射光束,并从检测器产生信号 并且基于在检测器处接收的反射光产生信号,并且检测处理端点。 该信号是时变循环信号,其随着层的厚度随时间而变化,并且检测处理端点包括检测循环信号的周期的一部分已经过去,该部分小于全周期 循环信号。

    TRANSPARENT WINDOW IN A POLISHING PAD
    2.
    发明申请
    TRANSPARENT WINDOW IN A POLISHING PAD 审中-公开
    抛光窗中的透明窗

    公开(公告)号:US20140038501A1

    公开(公告)日:2014-02-06

    申请号:US14051308

    申请日:2013-10-10

    Abstract: A polishing pad assembly for a chemical mechanical polishing apparatus includes a polishing pad having a polishing surface and a surface opposite the polishing surface for attachment to a platen, and a solid light-transmissive window formed in the polishing pad. The light-transmissive window is more transmissive to light than the polishing pad. The light-transmissive window has a light-diffusing bottom surface.

    Abstract translation: 用于化学机械抛光装置的抛光垫组件包括抛光垫,抛光垫具有抛光表面和与抛光表面相对的表面,用于附接到压板,以及形成在抛光垫中的固体透光窗。 光透射窗比抛光垫更透光。 透光窗具有光扩散底面。

Patent Agency Ranking