公开(公告)号：US20170200585A1

公开(公告)日：2017-07-13

申请号：US15104461

申请日：2015-06-15

Applicant: Applied Materials, Inc.

Inventor： Rongping WANG ,  Ruizhe REN ,  Jon C. FARR ,  Chethan MANGALORE ,  Peter DEMONTE ,  Parthiban BALAKRISHNA

IPC: H01J37/32 ,  H01F27/28

CPC classification number: H01J37/3211 ,  H01F27/28 ,  H01J37/321 ,  H01J37/32651 ,  H01J2237/3341 ,  H01J2237/3344

Abstract: Embodiments of the present disclosure include a radial frequency plasma source having a split type inner coil assembly. In one embodiment, the split type inner coil assembly comprises two intertwining coils. In another embodiment, the split type inner coil assembly includes looped coils forming a dome.