公开(公告)号：US20250085056A1

公开(公告)日：2025-03-13

申请号：US18463038

申请日：2023-09-07

Applicant: Applied Materials, Inc.

Inventor： Wolfgang R. ADERHOLD ,  Peter DEMONTE

IPC: F27D3/00

Abstract: A processing system is provided including a first chamber and a second chamber. The first chamber includes: a chamber body enclosing an interior volume; an edge ring having a top and a bottom, the edge ring including a first ledge extending inwardly from the top and a second ledge extending inwardly relative to the first ledge. The first ledge is configured to support a substrate and the second ledge is configured to support a susceptor. The first chamber further includes a plurality of heating lamps positioned over the edge ring. The second chamber includes: a chamber body enclosing an interior volume; a first cooling plate; one or more robots in the interior volume of the second chamber, the one or more robots having one or more end effectors positioned over the first cooling plate; and a plurality of lift pins extending through the first cooling plate.

公开(公告)号：US20170200585A1

公开(公告)日：2017-07-13

申请号：US15104461

申请日：2015-06-15

Applicant: Applied Materials, Inc.

Inventor： Rongping WANG ,  Ruizhe REN ,  Jon C. FARR ,  Chethan MANGALORE ,  Peter DEMONTE ,  Parthiban BALAKRISHNA

IPC: H01J37/32 ,  H01F27/28

CPC classification number: H01J37/3211 ,  H01F27/28 ,  H01J37/321 ,  H01J37/32651 ,  H01J2237/3341 ,  H01J2237/3344

Abstract: Embodiments of the present disclosure include a radial frequency plasma source having a split type inner coil assembly. In one embodiment, the split type inner coil assembly comprises two intertwining coils. In another embodiment, the split type inner coil assembly includes looped coils forming a dome.

公开(公告)号：US20160204005A1

公开(公告)日：2016-07-14

申请号：US14973079

申请日：2015-12-17

Applicant: Applied Materials, Inc.

Inventor： Shinichi OKI ,  Yuji AOKI ,  Peter DEMONTE ,  Yoshinobu MORI

IPC: H01L21/67 ,  C23C16/458 ,  C23C16/455

Abstract: A processing chamber for processing a substrate is disclosed herein. In one embodiment, the processing chamber includes a support shaft assembly. The support shaft assembly has a ring shaped susceptor, a disc shaped heat plate, and a support shaft system. The support shaft system supports the susceptor and the heat plate, such that the susceptor is supported above the heat plate defining a gap between the heat plate and the susceptor. In another embodiment, the heat plate includes a plurality of grooves and the susceptor includes a plurality of fins. The fins are configured to sit within the grooves such that the susceptor is supported above the heat plate, defining a gap between the heat plate and the susceptor. In another embodiment, a method of processing a substrate in the aforementioned embodiments is disclosed herein.

Abstract translation: 本文公开了一种用于处理衬底的处理室。 在一个实施例中，处理室包括支撑轴组件。 支撑轴组件具有环形基座，盘形加热板和支撑轴系统。 支撑轴系支撑基座和加热板，使得基座支撑在加热板上方，限定加热板和基座之间的间隙。 在另一个实施例中，加热板包括多个槽，并且基座包括多个翅片。 翅片构造成位于凹槽内，使得基座支撑在加热板上方，从而限定加热板和基座之间的间隙。 在另一个实施例中，本文公开了上述实施例中的衬底的处理方法。