公开(公告)号：US10832931B2

公开(公告)日：2020-11-10

申请号：US14696747

申请日：2015-04-27

Applicant: APPLIED MATERIALS, INC.

Inventor： Chethan Mangalore ,  Arumuga Balan ,  Jeonghoon Oh

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687 ,  H05B6/06 ,  H05B6/10

Abstract: An electrostatic chuck for retaining a substrate is provided herein. In some embodiments, an electrostatic chuck for retaining a substrate may include a susceptor including an electrically conductive susceptor base having one or more cooling channels formed in an upper surface thereof; a raised central support disposed over the one or more cooling channels; and a dielectric top plate disposed on the raised central support, wherein the dielectric top plate has an embossed top surface, and wherein the dielectric top plate and raised central support include a plurality of holes to facilitate delivery of a cooling gas one or more cooling channels to a backside of the substrate when disposed on the embossed top surface of the dielectric top plate.

公开(公告)号：US10211030B2

公开(公告)日：2019-02-19

申请号：US15104461

申请日：2015-06-15

Applicant: Applied Materials, Inc.

Inventor： Rongping Wang ,  Ruizhe Ren ,  Jon C. Farr ,  Chethan Mangalore ,  Peter Demonte ,  Parthiban Balakrishna

IPC: H01F27/28 ,  H01J37/32

Abstract: Embodiments of the present disclosure include a radial frequency plasma source having a split type inner coil assembly. In one embodiment, the split type inner coil assembly comprises two intertwining coils. In another embodiment, the split type inner coil assembly includes looped coils forming a dome.