公开(公告)号：US20210249280A1

公开(公告)日：2021-08-12

申请号：US17051071

申请日：2019-05-02

Applicant: Applied Materials, Inc.

Inventor： Tuochuan HUANG ,  Gang PENG ,  David W. GROECHEL ,  Vijay D. PARKHE ,  Shinnosuke KAWAGUCHI ,  David BENJAMINSON

IPC: H01L21/67 ,  H01L21/683 ,  B08B3/12

Abstract: Embodiments described herein relate a cleaning fixture and method to prevent chemical solutions from contacting the various substrate supporting member features and penetrating into the holes and the metal plate of the substrate supporting surface. The cleaning fixture includes a mounting plate having a plurality of thru-holes arranged on a bolt circle and configured to align with a plurality of thread holes disposed in an electrostatic chuck, a recess formed in the mounting plate, and a gas port formed through the mounting plate. A sealed plenum is formed between the recess of the mounting plate and a lower surface of the electrostatic chuck when the electrostatic chuck is coupled to the mounting plate. The gas port is fluidly coupled to the sealed plenum.