公开(公告)号：US12139790B2

公开(公告)日：2024-11-12

申请号：US17753524

申请日：2020-09-09

Applicant: Applied Materials, Inc.

Inventor： Vishwas Kumar Pandey ,  Christopher Olsen ,  Rene George ,  Eric Shono ,  Lara Hawrylchak ,  Erika Hansen ,  Tobin Kaufman-Osborn ,  Hansel Lo ,  Kartik Shah

IPC: C23C16/40 ,  C23C16/455 ,  C23C16/458 ,  C23C16/52 ,  H01L21/67

Abstract: Embodiments described herein generally relate to a processing system and a method of delivering a reactant gas. The processing system includes a substrate support system, an injection cone, and an intake. The injection cone includes a linear rudder. The linear rudder is disposed such that the flow of reactant gas through the injection cone results in film growth on a specific portion of a substrate. The method includes flowing the gas through the injection cone and delivering the gas onto the substrate below. The localization of the reactant gas, allows for film growth on a specific portion of the substrate.