公开(公告)号：US20170306482A1

公开(公告)日：2017-10-26

申请号：US15644554

申请日：2017-07-07

Applicant: Applied Materials, Inc.

Inventor： Kengo OHASHI ,  Takao HASHIMOTO ,  Shinobu ABE

IPC: C23C16/44 ,  H01J37/32

CPC classification number: C23C16/4405 ,  H01J37/32449 ,  H01J37/32862

Abstract: The present invention generally provides a processing chamber having shadow frame supports that direct cleaning gas flow to the corners of the chamber. The shadow frame supports are disposed along part of the chamber walls, thus leaving the corners unoccupied. During cleaning, the shadow frame is disposed in a way that it rests on both the substrate support and the shadow frame supports. Therefore, the cleaning gas flowing along the chamber walls is blocked by the shadow frame supports and the cleaning gas is forced to the corners since the shadow frame supports do not extend to the corners.

公开(公告)号：US20140109940A1

公开(公告)日：2014-04-24

申请号：US14037719

申请日：2013-09-26

Applicant: Applied Materials, Inc.

Inventor： Kengo OHASHI ,  Takao HASHIMOTO ,  Shinobu ABE

IPC: B08B7/00

CPC classification number: C23C16/4405 ,  H01J37/32449 ,  H01J37/32862

Abstract: The present invention generally provides a processing chamber having shadow frame supports that direct cleaning gas flow to the corners of the chamber. The shadow frame supports are disposed along part of the chamber walls, thus leaving the corners unoccupied. During cleaning, the shadow frame is disposed in a way that it rests on both the substrate support and the shadow frame supports. Therefore, the cleaning gas flowing along the chamber walls is blocked by the shadow frame supports and the cleaning gas is forced to the corners since the shadow frame supports do not extend to the corners.

Abstract translation: 本发明总体上提供了一种处理室，该处理室具有将清洁气流引导到室的角部的阴影框架支架。 阴影框架支撑件沿着室壁的一部分设置，从而使得角部未被占据。 在清洁期间，阴影框架以其搁置在基板支撑件和阴影框架支架上的方式设置。 因此，沿着室壁流动的清洁气体被阴影框架支撑件阻挡，并且由于阴影框架支撑件不延伸到拐角，清洁气体被迫到角落。