公开(公告)号：US20250053086A1

公开(公告)日：2025-02-13

申请号：US18769151

申请日：2024-07-10

Applicant: Applied Materials, Inc.

Inventor： MADHUR SACHAN ,  BO XIE ,  LAKMAL CHARIDU KALUTARAGE ,  ZHENXING HAN ,  TZU SHUN YANG ,  LI-QUN XIA

IPC: G03F7/004 ,  G03F7/075 ,  G03F7/16 ,  G03F7/20

Abstract: Embodiments disclosed herein include a method of post development treatment of a metal-oxide photoresist. In an embodiment, a method includes depositing a metal-oxide photoresist over a substrate, exposing the metal-oxide photoresist with an extreme ultra-violet (EUV) exposure to form exposed regions and unexposed regions, developing the exposed metal-oxide photoresist, and performing a surface treatment of the developed metal-oxide photoresist to form a coating on the developed metal-oxide photoresist.