公开(公告)号：US20130284204A1

公开(公告)日：2013-10-31

申请号：US13856962

申请日：2013-04-04

Applicant: Applied Materials, Inc.

Inventor： BO XIE ,  Alexandros T. Demos ,  Scott A. Hendrickson ,  Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez

IPC: B08B7/00

CPC classification number: B08B7/0021 ,  B08B7/0035 ,  C23C16/4405 ,  H01J37/3244 ,  H01J37/32862

Abstract: Embodiments of the invention generally provide methods for cleaning a UV processing chamber. In one embodiment, the method includes flowing an oxygen-containing gas through a plurality of passages formed in a UV transparent gas distribution showerhead and into a processing region located between the UV transparent gas distribution showerhead and a substrate support disposed within the thermal processing chamber, exposing the oxygen-containing gas to UV radiation under a pressure scheme comprising a low pressure stage and a high pressure stage to generate reactive oxygen radicals, and removing unwanted residues or deposition build-up from exposed surfaces of chamber components presented in the thermal processing chamber using the reactive oxygen radicals.

Abstract translation: 本发明的实施例通常提供用于清洁UV处理室的方法。 在一个实施方案中，该方法包括使含氧气体通过形成在UV透明气体分配喷头中的多个通道流入位于UV透明气体分配喷头和位于热处理室内的基板支架之间的处理区域中， 在包含低压级和高压级的压力方案下将含氧气体暴露于紫外线辐射以产生活性氧自由基，以及从在热处理室中呈现的腔室组分的暴露表面去除不需要的残留物或沉积物 使用活性氧自由基。

公开(公告)号：US20250053086A1

公开(公告)日：2025-02-13

申请号：US18769151

申请日：2024-07-10

Applicant: Applied Materials, Inc.

Inventor： MADHUR SACHAN ,  BO XIE ,  LAKMAL CHARIDU KALUTARAGE ,  ZHENXING HAN ,  TZU SHUN YANG ,  LI-QUN XIA

IPC: G03F7/004 ,  G03F7/075 ,  G03F7/16 ,  G03F7/20

Abstract: Embodiments disclosed herein include a method of post development treatment of a metal-oxide photoresist. In an embodiment, a method includes depositing a metal-oxide photoresist over a substrate, exposing the metal-oxide photoresist with an extreme ultra-violet (EUV) exposure to form exposed regions and unexposed regions, developing the exposed metal-oxide photoresist, and performing a surface treatment of the developed metal-oxide photoresist to form a coating on the developed metal-oxide photoresist.