公开(公告)号：US20240416514A1

公开(公告)日：2024-12-19

申请号：US18819400

申请日：2024-08-29

Applicant: Applied Materials, Inc.

Inventor： Nicholas Michael Kopec ,  Lyle Kosinski ,  Matvey Farber ,  Jeffrey Hudgens

IPC: B25J9/16 ,  B25J21/00 ,  H01L21/00 ,  H01L21/67 ,  H01L21/673

Abstract: A calibration system is of a wafer processing system. The calibration system includes a calibration substrate configured to be disposed on a plurality of support structures of the wafer processing system. The calibration substrate includes a calibration pin. The calibration substrate enables a calibration operation of a robot arm of the wafer processing system to automatically determine robot arm error of the robot arm.

公开(公告)号：US20220324100A1

公开(公告)日：2022-10-13

申请号：US17850296

申请日：2022-06-27

Applicant: Applied Materials, Inc.

Inventor： Nicholas Michael Kopec ,  Lyle Kosinski ,  Matvey Farber ,  Jeffrey Hudgens

IPC: B25J9/16 ,  H01L21/67 ,  H01L21/00 ,  H01L21/673 ,  B25J21/00

Abstract: An autoteach system includes an autoteach pin that is a scannable feature having a fixed position within the autoteach system. The autoteach pin enables an autoteach operation of a robot arm of the wafer processing system. The autoteach operation is an operation to automatically teach the fixed position within the autoteach system to the robot arm of the wafer processing system. The autoteach pin includes a first portion including a cylindrical sidewall. The robot arm is to use the first portion to locate the fixed position within the autoteach system. The autoteach portion further includes a second portion including planar sidewalls that are configured to enable calibration of robot arm error.

公开(公告)号：US12076863B2

公开(公告)日：2024-09-03

申请号：US17850296

申请日：2022-06-27

Applicant: Applied Materials, Inc.

Inventor： Nicholas Michael Kopec ,  Lyle Kosinski ,  Matvey Farber ,  Jeffrey Hudgens

IPC: H01L21/67 ,  B25J9/16 ,  B25J21/00 ,  H01L21/00 ,  H01L21/673

CPC classification number: B25J9/163 ,  B25J9/1653 ,  B25J21/005 ,  H01L21/00 ,  H01L21/67 ,  H01L21/6735 ,  G05B2219/45031

Abstract: An autoteach system includes an autoteach pin that is a scannable feature having a fixed position within the autoteach system. The autoteach pin enables an autoteach operation of a robot arm of the wafer processing system. The autoteach operation is an operation to automatically teach the fixed position within the autoteach system to the robot arm of the wafer processing system. The autoteach pin includes a first portion including a cylindrical sidewall. The robot arm is to use the first portion to locate the fixed position within the autoteach system. The autoteach portion further includes a second portion including planar sidewalls that are configured to enable calibration of robot arm error.

公开(公告)号：US11370114B2

公开(公告)日：2022-06-28

申请号：US16708337

申请日：2019-12-09

Applicant: Applied Materials, Inc.

Inventor： Nicholas Michael Kopec ,  Lyle Kosinski ,  Matvey Farber ,  Jeffrey Hudgens

IPC: H01L21/67 ,  B25J9/16 ,  H01L21/00 ,  H01L21/673 ,  B25J21/00

Abstract: An autoteach enclosure system includes a plurality of surfaces that at least partially enclose an interior volume of the autoteach enclosure system. The autoteach enclosure system further includes an autoteach pin at least partially disposed within the interior volume. The autoteach pin is a scannable feature having a fixed position within the autoteach enclosure system. The autoteach enclosure system further includes a front interface coupled to one or more of the plurality of surfaces to interface the autoteach enclosure system with a substantially vertical portion of a load port of a wafer processing system. The autoteach pin enables an autoteach operation of a robot arm of the wafer processing system. The autoteach operation is an operation to automatically teach the fixed position within the autoteach enclosure system to the robot arm of the wafer processing system.

公开(公告)号：US20210170584A1

公开(公告)日：2021-06-10

申请号：US16708337

申请日：2019-12-09

Applicant: Applied Materials, Inc.

Inventor： Nicholas Michael Kopec ,  Lyle Kosinski ,  Matvey Farber ,  Jeffrey Hudgens

IPC: B25J9/16

Abstract: An autoteach enclosure system includes a plurality of surfaces that at least partially enclose an interior volume of the autoteach enclosure system. The autoteach enclosure system further includes an autoteach pin at least partially disposed within the interior volume. The autoteach pin is a scannable feature having a fixed position within the autoteach enclosure system. The autoteach enclosure system further includes a front interface coupled to one or more of the plurality of surfaces to interface the autoteach enclosure system with a substantially vertical portion of a load port of a wafer processing system. The autoteach pin enables an autoteach operation of a robot arm of the wafer processing system. The autoteach operation is an operation to automatically teach the fixed position within the autoteach enclosure system to the robot arm of the wafer processing system.