公开(公告)号：US20250076768A1

公开(公告)日：2025-03-06

申请号：US18555896

申请日：2023-04-17

Applicant: Applied Materials, Inc.

Inventor： Zhongchuan Zhang ,  Rendong Lin ,  Meenaradchagan Vishnu ,  Tamer Coskun ,  Ulrich Mueller ,  Thomas L. Laidig ,  Jang Fung Chen

IPC: G03F7/20 ,  G03F9/00

Abstract: Embodiments of the disclosure relate to digital lithography system and related methods, the system including at least one light source configured to emit a light beam onto a substrate via a lens, at least one image sensor, configured to detect a reflected light beam from the substrate via the lens, at least one motor configured to move the lens to focus the light beam onto the substrate, and a controller in communication with the at least one light source, the at least one image sensor and the at least one motor, wherein the controller is to actuate the at least one motor to move the lens in response to at least one signal from the at least one image sensor.

公开(公告)号：US11067905B1

公开(公告)日：2021-07-20

申请号：US17058529

申请日：2019-04-09

Applicant: Applied Materials, Inc.

Inventor： Diana Valverde-Paniagua ,  Zhongchuan Zhang ,  Rendong Lin ,  Zheng Gu ,  Meenaradchagan Vishnu ,  Glen Alan Gomes

IPC: G03F7/20

Abstract: Embodiments of the systems and methods discussed herein autofocus an imaging apparatus by pre-processing image data received via channels of the imaging system that include laser beams and sensors configured to receive image data when laser beams are applied across a substrate in a pixel-wise application across a substrate. The substrate can include both a photoresist and metallic material, and the images as-received by the sensors include noise from the metallic material. During pre-processing of the image data, a percentage of noise to remove from the image data is determined, and the image data is filtered. A centroid of the substrate is calculated for each channel and a focus deviation for the exposure is determined. The centroids can be combined using one or more filtering mechanisms, and the imaging system can be autofocused in an exposure position by moving the stage and/or the exposure source in one or more directions.