公开(公告)号：US09735034B2

公开(公告)日：2017-08-15

申请号：US14456682

申请日：2014-08-11

申请人： Applied Materials, Inc.

发明人： Kim Vellore ,  Dinesh Kanawade ,  Stephen Moffatt ,  Aaron Miller ,  Leonid M. Tertitski ,  Norman L. Tam ,  Michael Liu ,  Colin Fox

IPC分类号： H05B3/68 ,  H01L21/67

CPC分类号： H01L21/67248 ,  H01L21/67115

摘要： Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US09514969B2

公开(公告)日：2016-12-06

申请号：US14550781

申请日：2014-11-21

申请人： Applied Materials, Inc.

发明人： Aaron Miller ,  Mehran Behdjat ,  Norman L. Tam ,  Michael Liu

IPC分类号： H01L21/67 ,  H01L21/66 ,  H01L21/324 ,  H01L21/687

CPC分类号： H01L21/67115 ,  H01L21/67248 ,  H01L21/68792

摘要： Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.

摘要翻译： 本公开的实施例提供一种盖组件，其包括设置在基板的装置侧表面和反射板之间的盖，所述盖设置在热处理室内。 衬底的器件侧表面与反射板之间的存在与常规热处理室设计相比具有许多优点，其包括在处理期间改进的温度均匀性，减少的室停机时间和改进的拥有成本 在热处理室中进行的处理。 在一些构造中，盖包括形成在其中的两个或更多个端口，并且被定位成在处理期间将气体从形成在反射板和盖之间的空间传送到基板的期望区域，以减少横跨 基质。

公开(公告)号：US10571337B2

公开(公告)日：2020-02-25

申请号：US15663037

申请日：2017-07-28

申请人： Applied Materials, Inc.

发明人： Lara Hawrylchak ,  Samuel C. Howells ,  Wolfgang R. Aderhold ,  Leonid M. Tertitski ,  Michael Liu ,  Dongming Iu ,  Norman L. Tam ,  Ji-Dih Hu

IPC分类号： G01J5/00 ,  H01L21/324 ,  G05D23/19 ,  H01L21/66 ,  H05B1/02 ,  G01J5/60 ,  H01L21/687 ,  H05B3/00 ,  H01L21/67

摘要： Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one example, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.

公开(公告)号：US10109514B2

公开(公告)日：2018-10-23

申请号：US15675825

申请日：2017-08-14

申请人： Applied Materials, Inc.

发明人： Kim Vellore ,  Dinesh Kanawade ,  Stephen Moffatt ,  Aaron Miller ,  Leonid M. Tertitski ,  Norman L. Tam ,  Michael Liu ,  Colin Fox

IPC分类号： H05B3/68 ,  H01L21/67

摘要： Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US10948353B2

公开(公告)日：2021-03-16

申请号：US16741907

申请日：2020-01-14

申请人： Applied Materials, Inc.

发明人： Lara Hawrylchak ,  Samuel C. Howells ,  Wolfgang R. Aderhold ,  Leonid M. Tertitski ,  Michael Liu ,  Dongming Iu ,  Norman L. Tam ,  Ji-Dih Hu

IPC分类号： G01J5/00 ,  H01L21/324 ,  G05D23/19 ,  H01L21/66 ,  H05B1/02 ,  G01J5/60 ,  H01L21/687 ,  H05B3/00 ,  H01L21/67

摘要： Examples described herein generally relate to apparatus and methods for rapid thermal processing (RTP) of a substrate. In one or more embodiments, a process chamber includes chamber body, a window disposed on a first portion of the chamber body, a chamber bottom, and a shield disposed on a second portion of the chamber body. The shield has a flat surface facing the window to reduce reflected radiant energy to a back side of a substrate disposed in the process chamber during operation. The process chamber further includes an edge support for supporting the substrate and a cooling member disposed on the chamber bottom. The cooling member is disposed in proximity of the edge support to cool the edge support during low temperature operation in order to improve the temperature uniformity of the substrate.