公开(公告)号：US12283460B2

公开(公告)日：2025-04-22

申请号：US17897719

申请日：2022-08-29

Applicant: Applied Materials, Inc.

Inventor： Tyler Wills ,  Richard Allen Sprenkle

IPC: H01J37/317 ,  H01J37/304

Abstract: A system and method for creating a beam current profile that eliminates variations that are not position dependent is disclosed. The system includes two Faraday sensors; one which is moved across the ion beam and a second that remains at or near a certain location. The reference Faraday sensor is used to measure temporal variations in the beam current, while the movable Faraday sensor measures both the position dependent variations and the temporal variations. By combining these measurements, the actual position dependent variations of the scanned ion beam can be determined. This resultant beam current profile can then be used to control the scan speed of the electrostatic or magnetic scanner.

公开(公告)号：US20250140510A1

公开(公告)日：2025-05-01

申请号：US18497579

申请日：2023-10-30

Applicant: Applied Materials, Inc.

Inventor： Richard Allen Sprenkle

IPC: H01J37/04 ,  H01J37/317

Abstract: Techniques to dynamically tune components of an ion implanter are described. A method includes generating a first histogram for a first setting parameter of an ion implanter and a second histogram for a second setting parameter of the ion implanter. The histograms comprise a graphical representation of a distribution of data points across a range of values for each setting parameter. The method includes presenting the histograms on a user interface, receiving a control directive to modify a first range of values for the first setting parameter, predicting a modification to a second range of values for the second setting parameter based on the modification to the first range of values by a machine learning model, and presenting the second histogram for the second setting parameter to indicate the modification to the second range of values for the second setting parameter. Other embodiments are described and claimed.

公开(公告)号：US20240071719A1

公开(公告)日：2024-02-29

申请号：US17897719

申请日：2022-08-29

Applicant: Applied Materials, Inc.

Inventor： Tyler Wills ,  Richard Allen Sprenkle

IPC: H01J37/317 ,  H01J37/304

CPC classification number: H01J37/3171 ,  H01J37/304 ,  H01J2237/24405 ,  H01J2237/24564 ,  H01J2237/30483

Abstract: A system and method for creating a beam current profile that eliminates variations that are not position dependent is disclosed. The system includes two Faraday sensors; one which is moved across the ion beam and a second that remains at or near a certain location. The reference Faraday sensor is used to measure temporal variations in the beam current, while the movable Faraday sensor measures both the position dependent variations and the temporal variations. By combining these measurements, the actual position dependent variations of the scanned ion beam can be determined. This resultant beam current profile can then be used to control the scan speed of the electrostatic or magnetic scanner.

公开(公告)号：US20230013095A1

公开(公告)日：2023-01-19

申请号：US17375488

申请日：2021-07-14

Applicant: Applied Materials, Inc.

Inventor： Richard Allen Sprenkle ,  Richard White ,  Eric Donald Wilson ,  Shane Conley ,  Ana Samolov ,  Nilay A. Pradhan

IPC: H01J3/12 ,  G05B19/4155 ,  G06N20/00

Abstract: Techniques for adjusting the shape of an ion beam are described. Characteristics of a desired beam shape may be defined. The ion beam generator may include beam shaping elements associated with tunable parameters that can be set in combination with each other. A search space for the possible combinations is defined. A set of exploratory points in the search space are measured and used to interpolate a large number of interpolated points based on a regression model. Interpolated points that are associated with low confidence values may be measured. Based on the measured and interpolated points, clusters of tunable parameter combinations may be identified for evaluation. The clusters are evaluated for stability and sensitivity, and one of the clusters is selected based on the evaluation. The ion beam generator may be configured based on the selected cluster.