公开(公告)号：US20200278605A1

公开(公告)日：2020-09-03

申请号：US16290635

申请日：2019-03-01

Applicant: Applied Materials, Inc.

Inventor： Michael Y. YOUNG ,  Ludovic GODET ,  Robert J. VISSER

IPC: G03F7/00

Abstract: Methods and apparatus for stamp generation are disclosed using nano-resist and ultra violet blocking materials. In one non-limiting embodiment, a method of producing a copy of a stamp for generating electrical/optical components is disclosed comprising: providing the stamp; coating a bottom surface of the stamp with a ultra violet blocking material; curing the ultra violet blocking material on the bottom surface; contacting the stamp to a target substrate covered with a layer of imprint resist; curing the imprint resist with ultraviolet blocking material during the contacting of the stamp to the target substrate; and releasing the stamp from the target substrate with the cured layer of imprint resist.

公开(公告)号：US20220057710A1

公开(公告)日：2022-02-24

申请号：US17489551

申请日：2021-09-29

Applicant: Applied Materials, Inc.

Inventor： Michael Y. YOUNG ,  Ludovic GODET ,  Robert J. VISSER

IPC: G03F7/00

Abstract: Methods and apparatus for stamp generation are disclosed using nano-resist and ultra violet blocking materials. In one non-limiting embodiment, a method of producing a copy of a stamp for generating electrical/optical components is disclosed comprising: providing the stamp; coating a bottom surface of the stamp with a ultra violet blocking material; curing the ultra violet blocking material on the bottom surface; contacting the stamp to a target substrate covered with a layer of imprint resist; curing the imprint resist with ultraviolet blocking material during the contacting of the stamp to the target substrate; and releasing the stamp from the target substrate with the cured layer of imprint resist.

公开(公告)号：US20220392810A1

公开(公告)日：2022-12-08

申请号：US17770434

申请日：2020-12-08

Applicant: Applied Materials, Inc.

Inventor： Geetika BAJAJ ,  Prerna Sonthalia GORADIA ,  Robert J. VISSER

IPC: H01L21/66 ,  G01B15/04 ,  B05D1/00

Abstract: The enclosed disclosure relates to a method and apparatus for depositing functionalized nanoparticles within a semiconductor structure in order to create a nano-layer capable of enhancing imaging and contrast, The semiconductor structure can include any type of VNAND structure or 3D structure, The nanoparticles are formed in high-aspect ratio trenches of the structure and form a nano-layer. The functionalized nanoparticles comprise synthesized nanoparticles as well as organic molecules. The organic molecules are chosen to selectively bind to certain nanoparticles and surface materials.