公开(公告)号：US20250076767A1

公开(公告)日：2025-03-06

申请号：US18486726

申请日：2023-10-13

Applicant: Applied Materials, Inc.

Inventor： Ulrich Mueller ,  Thomas L. Laidig ,  Rudolf C. Brunner

IPC: G03F7/20

Abstract: A digital lithography system includes a stage configured to support a substrate, a bridge disposed above the stage, and a first lithographic processing unit coupled to the bridge. The first lithographic processing unit coupled to the bridge can include a scanning unit, a lithographic exposure unit, and an optical system shared by the scanning unit and the lithographic exposure unit. The scanning unit is to use the optical system to generate measurements of the substrate during a measurement operation, and the lithographic exposure unit is to use the optical system to perform digital lithographic exposure of the substrate using the optical system during an exposure operation.

公开(公告)号：US10599055B1

公开(公告)日：2020-03-24

申请号：US16192591

申请日：2018-11-15

Applicant: Applied Materials, Inc.

Inventor： Tamer Coskun ,  Rudolf C. Brunner

IPC: G03B27/42 ,  G03F9/00 ,  G03F7/20

Abstract: A method of aligning a plate containing a substrate is disclosed wherein multiple cameras with distinct fields of view are aligned with mark cells that are within the field of view of each of the multiple cameras.