公开(公告)号：US20200381276A1

公开(公告)日：2020-12-03

申请号：US16877357

申请日：2020-05-18

Applicant: Applied Materials, Inc.

Inventor： Srinivasa Rao YEDLA ,  Kirankumar Neelasandra SAVANDAIAH ,  Thomas BREZOCZKY ,  Bhaskar PRASAD ,  Shashikanth CHENNAKESHAVA ,  Sreenath SOVENAHALLI ,  Shankar KODLE

IPC: H01L21/67 ,  H01L21/687 ,  B25J15/00 ,  B25J9/04 ,  B25J11/00

Abstract: Aspects of the disclosure provided herein generally provide a substrate processing system that includes at least one processing module that includes a plurality of process stations coupled thereto and a substrate transferring device disposed within a transfer region of the processing module for transferring a plurality of substrates to two or more of the plurality of process stations. The methods and apparatuses disclosed herein are useful for performing vacuum processing on substrates wherein one or more substrates are transferred within the transfer region of processing module that is in direct communication with at least a portion of a processing region of a plurality of separately isolatable process stations during the process of transferring the one or more substrates. In some embodiments, a substrate is positioned and maintained on the same substrate support member during the process of transferring the substrate within the processing module and while the substrate is being processed in each of the plurality of process stations.

公开(公告)号：US20250118583A1

公开(公告)日：2025-04-10

申请号：US18377572

申请日：2023-10-06

Applicant: Applied Materials, Inc.

Inventor： Kirankumar Neelasandra SAVANDAIAH ,  Shankar KODLE ,  Thomas BREZOCZKY

IPC: H01L21/677 ,  H01L21/67

Abstract: A method including processing substrates in two stations on separate processing lines. In the first station of the first processing line, the method may include: loading a first substrate, and delivering a resource for a first configurable period, during which the resource is locked out from the first station of the second processing line. In the first station of the second processing line, the method may include: loading a second substrate, and delivering a resource for a second configurable period, during which the resource is locked out from the first station of the first processing line.