公开(公告)号：US20230197495A1

公开(公告)日：2023-06-22

申请号：US17553305

申请日：2021-12-16

Applicant: Applied Materials, Inc.

Inventor： James David CARDUCCI ,  Kenneth S. COLLINS ,  Michael R. RICE ,  Kartik RAMASWAMY ,  Silverst Antony RODRIGUES ,  Yang YANG

IPC: H01L21/683 ,  H01L21/687 ,  H01J37/32

CPC classification number: H01L21/6833 ,  H01L21/68742 ,  H01L21/68735 ,  H01J37/32724 ,  H01J37/32642 ,  H01J37/32834 ,  H01J2237/334

Abstract: Embodiments of substrate supports for use in substrate processing chambers are provided herein. In some embodiments, a substrate support for use in a substrate processing chamber includes: a pedestal having a first side configured to support a substrate and a second side opposite the first side; a plurality of substrate lift pins extending through the pedestal, wherein a plurality of first gaps are disposed between the plurality of substrate lift pins and respective ones of a plurality of substrate lift pin openings in the pedestal; and vacuum lines that extend from the plurality of substrate lift pin openings and that are configured to pump down the plurality of substrate lift pin openings.