公开(公告)号：US20240381753A1

公开(公告)日：2024-11-14

申请号：US18649723

申请日：2024-04-29

Applicant: Applied Materials, Inc.

Inventor： Yongkee Chae ,  Xun Li ,  Jun-Nan Liu ,  Shinobu Abe ,  Cheng-Pei Ouyang ,  Su-Ho Cho ,  Yong Jin Kim ,  Thomas Werner Zilbauer

IPC: H10K71/16 ,  H10K30/40 ,  H10K30/57 ,  H10K30/85

Abstract: A method includes obtaining a base structure of a tandem solar cell device and forming a transparent conductive oxide (TCO) layer on the base structure using a low damage sputter deposition (LDSD) process. The LDSD process includes a rotary facing sputter deposition process.

公开(公告)号：US20240381675A1

公开(公告)日：2024-11-14

申请号：US18649730

申请日：2024-04-29

Applicant: Applied Materials, Inc.

Inventor： Yongkee Chae ,  Yong Jin Kim ,  Cheng-Pei Ouyang ,  Su-Ho Cho

IPC: H10K39/15 ,  H10K30/57 ,  H10K30/88 ,  H10K39/10

Abstract: A method includes obtaining a set of tandem solar cell devices, and forming, on each tandem solar cell device of the set of tandem solar cell devices using a deposition process, a discrete encapsulation layer along an upper surface and side surfaces of the tandem solar cell device.