公开(公告)号：US20240381753A1

公开(公告)日：2024-11-14

申请号：US18649723

申请日：2024-04-29

Applicant: Applied Materials, Inc.

Inventor： Yongkee Chae ,  Xun Li ,  Jun-Nan Liu ,  Shinobu Abe ,  Cheng-Pei Ouyang ,  Su-Ho Cho ,  Yong Jin Kim ,  Thomas Werner Zilbauer

IPC: H10K71/16 ,  H10K30/40 ,  H10K30/57 ,  H10K30/85

Abstract: A method includes obtaining a base structure of a tandem solar cell device and forming a transparent conductive oxide (TCO) layer on the base structure using a low damage sputter deposition (LDSD) process. The LDSD process includes a rotary facing sputter deposition process.