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公开(公告)号:US11848218B2
公开(公告)日:2023-12-19
申请号:US17077711
申请日:2020-10-22
Applicant: Applied Materials, Inc.
Inventor: Katty Guyomard , Chidambara A. Ramalingam , Shawyon Jafari , Palash Joshi , Moin Ahmed Khan , Kirubanandan Naina Shanmugam , Subhaschandra Shreepad Salkod , Avishek Ghosh , David W. Groechel , Li Wu , Dorothea Buechel-Rimmel
CPC classification number: H01L21/67057 , B08B3/048
Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.
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公开(公告)号:US20220130692A1
公开(公告)日:2022-04-28
申请号:US17077711
申请日:2020-10-22
Applicant: Applied Materials, Inc.
Inventor: Katty Guyomard , Chidambara A. Ramalingam , Shawyon Jafari , Palash Joshi , Moin Ahmed Khan , Kirubanandan Naina Shanmugam , Subhaschandra Shreepad Salkod , Avishek Ghosh , David W. Groechel , Li Wu , Dorothea Buechel-Rimmel
Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.
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