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公开(公告)号：US10935492B2
公开(公告)日：2021-03-02
申请号：US16258392
申请日：2019-01-25
Applicant: Applied Materials, Inc.
Inventor： Avishek Ghosh , Byung-Sung Kwak , Todd Egan , Robert Jan Visser , Gangadhar Banappanavar , Dinesh Kabra
Abstract: An apparatus for determining a characteristic of a photoluminescent (PL) layer comprises: a light source that generates an excitation light that includes light from the visible or near-visible spectrum; an optical assembly configured to direct the excitation light onto a PL layer; a detector that is configured to receive a PL emission generated by the PL layer in response to the excitation light interacting with the PL layer and generate a signal based on the PL emission; and a computing device coupled to the detector and configured to receive the signal from the detector and determine a characteristic of the PL layer based on the signal.
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2.发明公开公开(公告)号：US20230213444A1
公开(公告)日：2023-07-06
申请号：US18122106
申请日：2023-03-15
Applicant: Applied Materials, Inc.
Inventor： Todd J. Egan , Avishek Ghosh , Edward W. Budiarto , Guoheng Zhao
CPC classification number: G01N21/41 , G01P13/00 , G01B11/303 , G01B11/0625 , G01N2201/06113 , G01N2201/127 , G01N2201/062
Abstract: Described are systems and techniques directed to optical inspection of moving products (wafers, substrates, films, patterns) that are being transported to or from processing chambers in device manufacturing systems. Implementations include a system that has a first source of light to direct a first light to a first location on a surface of a product. The first light generates, at the first location, a first reflected light. The system further includes a first optical sensor to generate a first data representative of a first reflected light, and a processing device, in communication with the first optical sensor to determine, using the first data, a property of the product.
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公开(公告)号：US11353389B2
公开(公告)日：2022-06-07
申请号：US17033521
申请日：2020-09-25
Applicant: Applied Materials, Inc.
Inventor： Mehdi Vaez-Iravani , Avishek Ghosh
Abstract: Examples disclosed herein relate to system and method for detecting the size of a particle in a fluid. The system includes a conduit for transporting a fluid and a sample area. Some of the fluid passes through the sample area. A first imaging device has an optical lens and a digital detector. A laser source emits a first laser beam. The digital detector generates a metric of an initial intensity of a scattered light that passes through the optical lens. The scattered light is scattered from particles passing through the sample area, and includes light from the first laser beam, which passes through the sample area. A controller outputs a corrected particle intensity based upon a comparison of the initial intensity to data representative of intensity of a focused and defocused particle. The corrected particle intensity generates a corrected metric corresponding to an actual size of the particles.
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公开(公告)号：US11927535B2
公开(公告)日：2024-03-12
申请号：US18129503
申请日：2023-03-31
Applicant: Applied Materials, Inc.
Inventor： Avishek Ghosh , Byung-Sung Kwak , Todd Egan , Robert Jan Visser , Gangadhar Banappanavar , Dinesh Kabra
CPC classification number: G01N21/6489 , G01N21/6408 , H10K50/182
Abstract: An apparatus for determining a characteristic of a photoluminescent (PL) layer comprises: a light source that generates an excitation light that includes light from the visible or near-visible spectrum; an optical assembly configured to direct the excitation light onto a PL layer; a detector that is configured to receive a PL emission generated by the PL layer in response to the excitation light interacting with the PL layer and generate a signal based on the PL emission; and a computing device coupled to the detector and configured to receive the signal from the detector and determine a characteristic of the PL layer based on the signal.
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公开(公告)号：US11662317B2
公开(公告)日：2023-05-30
申请号：US17188485
申请日：2021-03-01
Applicant: Applied Materials, Inc.
Inventor： Avishek Ghosh , Byung-Sung Kwak , Todd Egan , Robert Jan Visser , Gangadhar Banappanavar , Dinesh Kabra
CPC classification number: G01N21/6489 , G01N21/6408 , H01L51/5287
Abstract: An apparatus for determining a characteristic of a photoluminescent (PL) layer comprises: a light source that generates an excitation light that includes light from the visible or near-visible spectrum; an optical assembly configured to direct the excitation light onto a PL layer; a detector that is configured to receive a PL emission generated by the PL layer in response to the excitation light interacting with the PL layer and generate a signal based on the PL emission; and a computing device coupled to the detector and configured to receive the signal from the detector and determine a characteristic of the PL layer based on the signal.
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Patent Agency Ranking
公开(公告)号：US11848218B2
公开(公告)日：2023-12-19
申请号：US17077711
申请日：2020-10-22
Applicant: Applied Materials, Inc.
Inventor： Katty Guyomard , Chidambara A. Ramalingam , Shawyon Jafari , Palash Joshi , Moin Ahmed Khan , Kirubanandan Naina Shanmugam , Subhaschandra Shreepad Salkod , Avishek Ghosh , David W. Groechel , Li Wu , Dorothea Buechel-Rimmel
CPC classification number: H01L21/67057 , B08B3/048
Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.
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公开(公告)号：US20220130692A1
公开(公告)日：2022-04-28
申请号：US17077711
申请日：2020-10-22
Applicant: Applied Materials, Inc.
Inventor： Katty Guyomard , Chidambara A. Ramalingam , Shawyon Jafari , Palash Joshi , Moin Ahmed Khan , Kirubanandan Naina Shanmugam , Subhaschandra Shreepad Salkod , Avishek Ghosh , David W. Groechel , Li Wu , Dorothea Buechel-Rimmel
Abstract: Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.
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公开(公告)号：US11609183B2
公开(公告)日：2023-03-21
申请号：US16996579
申请日：2020-08-18
Applicant: Applied Materials, Inc.
Inventor： Todd J. Egan , Avishek Ghosh , Edward W. Budiarto , Guoheng Zhao
Abstract: Implementations disclosed describe an optical inspection device comprising a source of light to direct a light beam to a location on a surface of a wafer, the wafer being transported from a processing chamber, wherein the light beam is to generate, a reflected light, an optical sensor to collect a first data representative of a direction of the first reflected light, collect a second data representative of a plurality of values characterizing intensity of the reflected light at a corresponding one of a plurality of wavelengths, and a processing device, in communication with the optical sensor, to determine, using the first data, a position of the surface of the wafer; retrieve calibration data, and determine, using the position of the surface of the wafer, the second data, and the calibration data, a characteristic representative of a quality of the wafer.
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9.发明授权公开(公告)号：US11280717B2
公开(公告)日：2022-03-22
申请号：US15805725
申请日：2017-11-07
Applicant: APPLIED MATERIALS, INC.
Inventor： Prerna Goradia , Avishek Ghosh , Robert Jan Visser
Abstract: Methods and apparatuses for identifying contaminants in a semiconductor cleaning solution, including: contacting a semiconductor cleaning solution with a semiconductor manufacturing component to form an effluent including one or more insoluble analytes-of-interest; contacting the effluent including one or more insoluble analytes-of-interest with an optical apparatus configured to sense fluorescence and, optionally, Raman signals from the one or more insoluble analytes-of-interest, wherein the apparatus includes an electron multiplying charged couple device and a grating spectrometer to spectrally disperse the fluorescence and project the fluorescence on to the electron multiplying charged couple device; and identifying the one or more analytes of interest.
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公开(公告)号：US20220057323A1
公开(公告)日：2022-02-24
申请号：US16996579
申请日：2020-08-18
Applicant: Applied Materials, Inc.
Inventor： Todd J. Egan , Avishek Ghosh , Edward W. Budiarto , Guoheng Zhao
Abstract: Implementations disclosed describe an optical inspection device comprising a source of light to direct a light beam to a location on a surface of a wafer, the wafer being transported from a processing chamber, wherein the light beam is to generate, a reflected light, an optical sensor to collect a first data representative of a direction of the first reflected light, collect a second data representative of a plurality of values characterizing intensity of the reflected light at a corresponding one of a plurality of wavelengths, and a processing device, in communication with the optical sensor, to determine, using the first data, a position of the surface of the wafer; retrieve calibration data, and determine, using the position of the surface of the wafer, the second data, and the calibration data, a characteristic representative of a quality of the wafer.
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