公开(公告)号：US20220246481A1

公开(公告)日：2022-08-04

申请号：US17166288

申请日：2021-02-03

Applicant: Applied Materials, Inc.

Inventor： Bharath Ram Sundar ,  Raman K. Nurani ,  Utkarsha Avinash Dhanwate ,  Ramakrishnan S. Hariharan ,  Suresh Bharatharajan Kudallur ,  Vishwath Ram Amarnath

IPC: H01L21/66 ,  G06N20/00 ,  G06K9/62 ,  G01N23/04 ,  G01N23/2251

Abstract: A method includes obtaining sensor data associated with a deposition process performed in a process chamber to deposit a film stack on a surface of a substrate, wherein the film stack comprises a plurality of layers of a first material and a plurality of layers of a second material. The method further includes obtaining metrology data associated with the film stack. The method further includes training a first machine-learning model based on the sensor data and the metrology data, wherein the first machine-learning model is trained to generate predictive metrology data associated with layers of the first material. The method further includes training a second machine-learning model based on the sensor data and the metrology data, wherein the second machine-learning model is trained to generate predictive metrology data associated with layers of the second material.

公开(公告)号：US11862520B2

公开(公告)日：2024-01-02

申请号：US17166288

申请日：2021-02-03

Applicant: Applied Materials, Inc.

Inventor： Bharath Ram Sundar ,  Raman K. Nurani ,  Utkarsha Avinash Dhanwate ,  Ramakrishnan S. Hariharan ,  Suresh Bharatharajan Kudallur ,  Vishwath Ram Amarnath

IPC: H01L21/66 ,  G01N23/2251 ,  G01N23/04 ,  G06N20/00 ,  G06F18/214

CPC classification number: H01L22/12 ,  G01N23/04 ,  G01N23/2251 ,  G06F18/214 ,  G06N20/00 ,  H01L22/26

Abstract: A method includes obtaining sensor data associated with a deposition process performed in a process chamber to deposit a film stack on a surface of a substrate, wherein the film stack comprises a plurality of layers of a first material and a plurality of layers of a second material. The method further includes obtaining metrology data associated with the film stack. The method further includes training a first machine-learning model based on the sensor data and the metrology data, wherein the first machine-learning model is trained to generate predictive metrology data associated with layers of the first material. The method further includes training a second machine-learning model based on the sensor data and the metrology data, wherein the second machine-learning model is trained to generate predictive metrology data associated with layers of the second material.