公开(公告)号：US20220246481A1

公开(公告)日：2022-08-04

申请号：US17166288

申请日：2021-02-03

Applicant: Applied Materials, Inc.

Inventor： Bharath Ram Sundar ,  Raman K. Nurani ,  Utkarsha Avinash Dhanwate ,  Ramakrishnan S. Hariharan ,  Suresh Bharatharajan Kudallur ,  Vishwath Ram Amarnath

IPC: H01L21/66 ,  G06N20/00 ,  G06K9/62 ,  G01N23/04 ,  G01N23/2251

Abstract: A method includes obtaining sensor data associated with a deposition process performed in a process chamber to deposit a film stack on a surface of a substrate, wherein the film stack comprises a plurality of layers of a first material and a plurality of layers of a second material. The method further includes obtaining metrology data associated with the film stack. The method further includes training a first machine-learning model based on the sensor data and the metrology data, wherein the first machine-learning model is trained to generate predictive metrology data associated with layers of the first material. The method further includes training a second machine-learning model based on the sensor data and the metrology data, wherein the second machine-learning model is trained to generate predictive metrology data associated with layers of the second material.

公开(公告)号：US11862520B2

公开(公告)日：2024-01-02

申请号：US17166288

申请日：2021-02-03

Applicant: Applied Materials, Inc.

Inventor： Bharath Ram Sundar ,  Raman K. Nurani ,  Utkarsha Avinash Dhanwate ,  Ramakrishnan S. Hariharan ,  Suresh Bharatharajan Kudallur ,  Vishwath Ram Amarnath

IPC: H01L21/66 ,  G01N23/2251 ,  G01N23/04 ,  G06N20/00 ,  G06F18/214

CPC classification number: H01L22/12 ,  G01N23/04 ,  G01N23/2251 ,  G06F18/214 ,  G06N20/00 ,  H01L22/26

Abstract: A method includes obtaining sensor data associated with a deposition process performed in a process chamber to deposit a film stack on a surface of a substrate, wherein the film stack comprises a plurality of layers of a first material and a plurality of layers of a second material. The method further includes obtaining metrology data associated with the film stack. The method further includes training a first machine-learning model based on the sensor data and the metrology data, wherein the first machine-learning model is trained to generate predictive metrology data associated with layers of the first material. The method further includes training a second machine-learning model based on the sensor data and the metrology data, wherein the second machine-learning model is trained to generate predictive metrology data associated with layers of the second material.

公开(公告)号：US20240248466A1

公开(公告)日：2024-07-25

申请号：US18158370

申请日：2023-01-23

Applicant: Applied Materials, Inc.

Inventor： Arvind Shankar Raman ,  Harikrishnan Rajagopal ,  Minal Balkrishna Shettigar ,  Vishwath Ram Amarnath ,  Yi Qi

IPC: G05B23/02

CPC classification number: G05B23/024 ,  G05B23/0283

Abstract: Methods and systems for process chamber qualification for maintenance process endpoint detection are provided. Data collected by one or more sensors of a process chamber of a manufacturing system is identified. The identified data is collected during performance of initial maintenance operation(s) of a maintenance process. A current state of the process chamber is determined, based on the identified data, after the performance of the initial maintenance operation(s) based on the identified data. In response to a determination that the current state does not satisfy one or more chamber maintenance criteria, a set of subsequent maintenance operations to be performed to cause the current state of the process chamber to satisfy the criteria is identified. Performance of the set of subsequent maintenance operations is initiated at the process chamber.