公开(公告)号：US20200294750A1

公开(公告)日：2020-09-17

申请号：US16351956

申请日：2019-03-13

申请人： Applied Materials, Inc.

发明人： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC分类号： H01J27/02 ,  H01J27/08

摘要： An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

公开(公告)号：US20210134569A1

公开(公告)日：2021-05-06

申请号：US17150031

申请日：2021-01-15

申请人： Applied Materials, Inc.

发明人： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC分类号： H01J37/32 ,  H01J37/08 ,  H01J37/24

摘要： An ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

公开(公告)号：US11600473B2

公开(公告)日：2023-03-07

申请号：US17150031

申请日：2021-01-15

申请人： Applied Materials, Inc.

发明人： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC分类号： H01J37/32 ,  H01J37/24 ,  H01J37/08

摘要： An ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.

公开(公告)号：US10923306B2

公开(公告)日：2021-02-16

申请号：US16351956

申请日：2019-03-13

申请人： Applied Materials, Inc.

发明人： Svetlana B. Radovanov ,  Bon-Woong Koo ,  Alexandre Likhanskii

IPC分类号： H05B31/26 ,  H01J7/24 ,  H01J27/02 ,  H01J27/08

摘要： An indirectly heated cathode ion source having an electrically isolated extraction plate is disclosed. By isolating the extraction plate, a different voltage can be applied to the extraction plate than to the body of the arc chamber. By applying a more positive voltage to the extraction plate, more efficient ion source operation with higher plasma density can be achieved. In this mode the plasma potential is increased, and the electrostatic sheath reduces losses of electrons to the chamber walls. By applying a more negative voltage, an ion rich sheath adjacent to the extraction aperture can be created. In this mode, conditioning and cleaning of the extraction plate is achieved via ion bombardment. Further, in certain embodiments, the voltage applied to the extraction plate can be pulsed to allow ion extraction and cleaning to occur simultaneously.