SUBSTRATE SUPPORT BUSHING
    1.
    发明申请
    SUBSTRATE SUPPORT BUSHING 有权
    基座支撑

    公开(公告)号:US20130101241A1

    公开(公告)日:2013-04-25

    申请号:US13648082

    申请日:2012-10-09

    CPC classification number: C23C16/4586 C23C16/505 F16C29/02 H01L21/68742

    Abstract: A bushing assembly for supporting a substrate within a processing chamber is generally provided. In one aspect, the bushing assembly comprises a tubular body having an outer perimeter and an aperture extending therethrough, a first ring having a first inner edge, the first ring disposed in the aperture in an upper portion of the tubular body, and a second ring having a second inner edge, the second ring disposed in the aperture in a lower portion of the tubular body. In another aspect, the first inner edge has a first radius of curvature, and the second inner edge has a second radius of curvature. In another aspect, a first inner edge diameter, a second inner edge diameter, the first radius of curvature, and the second radius of curvature are selected such that a support pin extending through the aperture contacts the bushing assembly on at most two points.

    Abstract translation: 通常提供用于在处理室内支撑衬底的衬套组件。 在一个方面,套管组件包括具有外周边和延伸穿过其的孔的管状体,第一环具有第一内边缘,第一环设置在管状体的上部中的孔中,第二环 具有第二内边缘,所述第二环设置在所述管状体的下部中的所述孔中。 在另一方面,第一内边缘具有第一曲率半径,并且第二内边缘具有第二曲率半径。 在另一方面,选择第一内边缘直径,第二内边缘直径,第一曲率半径和第二曲率半径,使得延伸穿过孔的支撑销在最多两点处接触衬套组件。

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